All-optical modulation based on MoS2-Plasmonic nanoslit hybrid structures

Nanophotonics - Tập 10 Số 16 - Trang 3957-3965 - 2021
Feiying Sun1, Changbin Nie2, Xingzhan Wei2, Mao Hu3, Yupeng Zhang1, Guo Ping Wang1
1Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, People’s Republic of China
2Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences , Chongqing , 400714 , People’s Republic of China
3Guangdong Hongxin Technology Co. Ltd. , Dongguan , 523690 , People’s Republic of China

Tóm tắt

Abstract Two-dimensional (2D) materials with excellent optical properties and complementary metal-oxide-semiconductor (CMOS) compatibility have promising application prospects for developing highly efficient, small-scale all-optical modulators. However, due to the weak nonlinear light-material interaction, high power density and large contact area are usually required, resulting in low light modulation efficiency. In addition, the use of such large-band-gap materials limits the modulation wavelength. In this study, we propose an all-optical modulator integrated Si waveguide and single-layer MoS2 with a plasmonic nanoslit, wherein modulation and signal light beams are converted into plasmon through nanoslit confinement and together are strongly coupled to 2D MoS2. This enables MoS2 to absorb signal light with photon energies less than the bandgap, thereby achieving high-efficiency amplitude modulation at 1550 nm. As a result, the modulation efficiency of the device is up to 0.41 dB μm−1, and the effective size is only 9.7 µm. Compared with other 2D material-based all-optical modulators, this fabricated device exhibits excellent light modulation efficiency with a micron-level size, which is potential in small-scale optical modulators and chip-integration applications. Moreover, the MoS2-plasmonic nanoslit modulator also provides an opportunity for TMDs in the application of infrared optoelectronics.

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