A new 50-nm nMOSFET with side-gates for virtual source-drain extensions
Tóm tắt
We have proposed and fabricated a novel 50-nm nMOSFET with side-gates, which induce inversion layers for virtual source/drain extensions (SDE). The 50-nm nMOSFETs show excellent suppression of the short channel effect and reasonable current drivability [subthreshold swing of 86 mV/decade, drain-induced barrier lowering (DIBL) of 112 mV, and maximum transconductance (g/sub m/) of 470 /spl mu/S//spl mu/m at V/sub D/=1.5 V], resulting from the ultra-shallow virtual SDE junction. Since both the main gate and the side-gate give good cut-off characteristics, a possible advantage of this structure in an application to multi-input NAND gates was investigated.
Từ khóa
#MOSFETs #Inversion layersTài liệu tham khảo
10.1109/16.831004
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