A Study on Alignment Process of Ion Beam Irradiation to Improve LCD Productivity in Electric Installation Application

Journal of Electrical Engineering & Technology - Tập 15 - Trang 2395-2400 - 2020
Hak-Ryong Moon1, Jeong Min Han2, Hyun-Jae Lee3, Jin-Geun Shon4
1Department of Future Technology and Convergence Research, Korea Institute of Civil Engineering and Building Technology, Goyang, Korea
2Department of Electrical and Electronic Engineering, Gachon University, Seongnam, Korea
3Department of Electrical Engineering, Seoil University, Seoul, Korea
4Department of Electrical Engineering, Gachon University, Seongnam, Korea

Tóm tắt

In this study, we fabricated TN-LCD using DuoPIGatron ion beam with obliquely irradiated polyimide film and TN-LCD using conventional rubbing method, and compared the electro-optic characteristics. In the TN-LCD using the rubbing method, a pretilt angle of 0.05° was obtained, and it was confirmed that an excellent pretilt angle of 1.13° also occurred in the TN-LCD irradiated with an ion beam. In addition, voltage-transmittance characteristic, which is a characteristic for realizing gray scale, was measured using the TN-LCD manufactured as described above. And, the response time characteristic was measured as a basic feature to compose a screen without motion blur. As a result, both the TN-LCD using the rubbing method and the TN-LCD manufactured by ion beam irradiation showed good voltage-transmittance characteristics in the driving voltage range of 1.5–3.5 V. In particular, as a result of measuring the response time characteristics, the light-on time was measured at 5.11 ms and the light-off time was measured at 10.98 ms. This is a very good result at the level of TN-LCD without chiral dopant, which can be evaluated as comparable with the result of the production level.

Tài liệu tham khảo

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