A CMOS Image Sensor Integrated with Plasmonic Colour Filters

Catrysse PB, Wandell BA (2005) Roadmap for CMOS image sensors: Moore meets Planck and Sommerfeld. Proc SPIE 5678:1

Koo C, Kim H, Paik K, Park D, Lee K, Park Y, Moon C, Lee S, Hwang S, Lee D, Kong J (2007) Improvement of crosstalk on 5M CMOS image sensor with 1.7 × 1.7 μm2 pixels. Proc SPIE 6471:647115

Hsu TH, Fang YK, Lin CY, Chen SF, Lin CS, Yaung DN, Wuu SG, Chien HC, Tseng CH, Lin JS (2004) Light guide for pixel crosstalk improvement in deep submicron CMOS image sensor. IEEE Electron Device Lett 25:22

Kanamori Y, Shimono M, Hane K (2006) Fabrication of transmission colour filters using silicon subwavelength gratings on quartz substrates. IEEE Photon Technol Lett 18:2126–2128

Inaba Y, Kasano M, Tanaka K, Yamaguchi T (2006) Degradation-free MOS image sensor with photonic crystal colour filter. IEEE Electron Device Lett 27:457

Frey L, Parrein P, Raby J, Pellé C, Hérault D, Marty M, Michailos J (2011) Color filters including infrared cut-off integrated on CMOS image sensor. Opt Express 19:13073

Ghaemi HF, Thio T, Grupp DE, Ebbesen TW, Lezec HJ (1998) Surface plasmons enhance optical transmission through subwavelength holes. Phys Rev B 58:6779–6782

Lee H-S, Yoon Y-T, Lee S-S, Kim S-H, Lee K-D (2007) Colour filter based on a subwavelength patterned metal grating. Opt Express 15:15457–15463

Chen Q, Cumming DRS (2010) High transmission and low colour cross-talk plasmonic colour filters using triangular-lattice hole arrays in aluminium films. Opt Express 18:14056

Xu T, Wu Y, Luo X, Guo LJ (2010) Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging. Nat Commun 1:59

Catrysse PB, Wandell BA (2003) Integrated colour pixels in 0.18 μm complementary metal oxide semiconductor technology. J Opt Soc Am A 20:2293

Catrysse PB (2005) Monolithic integration of electronics and sub-wavelength metal optics in deep submicron CMOS technology. Mater Res Soc Symp Proc 869:53

Yoon Y, Lee S, Lee B (2010) Visible filter integrated with an image sensor fabricated by a 90-nm standard CMOS process. LEOS, ThJ2.

Tang L, Latif S, Miller DAB (2009) Plasmonic device in silicon CMOS. Electron Lett 45(13)

Chen Q, Chitnis D, Walls K, Drysdale TD, Collins S, Cumming DRS (2012) CMOS photo detectors integrated with plasmonic colour filters. IEEE Photonic Technol Lett 24:197

Genet C, Ebbesen TW (2007) Light in tiny holes. Nature 445:39–46

Barnes WL, Dereux A, Ebbesen TW (2003) Surface plasmon subwavelength optics. Nature 424:824–830

Das D, Collins S (2010) A wide dynamic range integrating pixel with an improved low light sensitivity. Proc ISCAS 2010, pp. 4261–4264

CIE free documents for download: CIE 1931 standard colorimetric observer data. http://www.cie.co.at/index.php/LEFTMENUE/index.php?i_ca_id=298 . Accessed 21 March 2012

Krishnan A, Thio T, Kim TJ, Lezec HJ, Ebbesen TW, Wolff PA, Pendry J, Martin-Moreno L, Garcia-Vidal FJ (2001) Evanescently coupled resonance in surface plasmon enhanced transmission. Opt Commun 200:1

Schaadt DM, Feng B, Yu ET (2005) Enhanced semiconductor optical absorption via surface plasmon excitation in metal naonparticles. Appl Phys Lett 86:063106