RETRACTED ARTICLE: Sub-10 nm Thin Film Feature Sizes of Chemically Tailored Poly(styrene-block-methyl methacrylate) with Randomly Distributed Fluorine Units
Chinese Journal of Polymer Science - Trang 1-11 - 2022
Tài liệu tham khảo
Hayakawa, T.; Dong, L.; Dazai, T.; Miyagi, K.; Mori, L.; Kawana D. Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer, US 11,472,956 B2, United States Patent, 2022.
Hayakawa, T.; Dong, L.; Dazai, T.; Miyagi, K.; Mori, L.; Kawana, D. Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer, JP 2022-20519 A, Japan Patent, 2022.