High level compressive residual stresses produced in aluminum alloys by laser shock processing
Tài liệu tham khảo
Fairand, 1974, Quantitative assessment of laser-induced stress waves generated at confined surfaces, Appl. Phys. Lett., 25, 431, 10.1063/1.1655536
Fabbro, 1990, Physical study of laser-produced plasma in confined geometry, J. Appl. Phys., 68, 775, 10.1063/1.346783
O’Keefe, 1972, Laser induced stress-wave and impulse augmentation, Appl. Phys. Lett., 21, 464, 10.1063/1.1654220
Hoffman, 1974, Laser–target interactions, J. Appl. Phys., 45, 2125, 10.1063/1.1663556
Yang, 1974, Stress waves generated in thin metallic films by a Qswitched ruby laser, J. Appl. Phys., 45, 2601, 10.1063/1.1663636
Ling, 1995, Laser-generated shock waves in thin films of energetic materials, J. Appl. Phys., 78, 7022, 10.1063/1.360471
Couturier, 1996, Shock profile induced by short laser pulses, J. Appl. Phys., 79, 9338, 10.1063/1.362578
Ocaña, 2000, A model for the coupled predictive assessment of plasma expansion and material compression in laser shock processing applications, Proc. SPIE, 3885, 252, 10.1117/12.376970
Ocaña, 2004, Experimental assessment of the influence of irradiation parameters on surface deformation and residual stresses in laser shock processed metallic alloys, Appl. Surf. Sci., 238, 501, 10.1016/j.apsusc.2004.05.246
Molpeceres, 2003, Experimental assessment of materials treatment by laser shock processing, Optica pura y Aplicada, 36, 51
Rubio-Gonzalez, 2004, Effect of laser shock processing on fatigue crack growth and fracture toughness of 6061-T6 aluminum alloy, Mater. Sci. Eng., 386, 291, 10.1016/j.msea.2004.07.025
Schmidt-Uhlig, 2000, Laser shock processing with 20 MW laser pulses delivered by optical fibers, Eur. Phys. J.: Appl. Phys., 9, 235, 10.1051/epjap:2000109
ASTM 2002, Annual Book of ASTM Standards, v.03.01 no.E837-01, Standard Test Method for Determining Residual Stresses by the Hole Drilling Strain Gage Method.
1996
Peyre, 1995, Laser shock processing: a review of the physics and applications, Opt. Quant. Electron., 27, 1213