Jianguo Wen1, Zhongping Huang1, D. Z. Wang1, J. H. Chen1, Shihe Yang1, Ren Z1, J. H. Wang2, Laurie E. Calvet3, Juliana Chen3, James F. Klemic3, Mark Reed3
1Department of Physics, Boston College, 02467, Chestnut Hill, Massachusetts, USA
2Department of Chemistry, State University of New York, 14260, Buffalo, New York, USA
3Departments of Applied Physics, Electrical Engineering and Physics, Yale University, 06520-8284, New Haven, Connecticut, USA
Tóm tắt
Microstructures of well-aligned multiwall carbon nanotubes grown on patterned nickel nanodots and uniform thin films by plasma-enhanced chemical vapor deposition have been studied by electron microscopy. It was found that growth of carbon nanotubes on patterned nickel nanodots and uniform thin films is different. During growth of carbon nanotubes, a nickel particle sits at the tip of each nanotube, and its [220] is preferentially oriented along the plasma direction, which can be explained by a channeling effect of ions coming into nickel particles in plasma. The alignment of nanotubes is induced by the electrical field direction relative to substrate surface.
