Round Robin Test for Depth Profiling of SiO2/Si Multilayer

Analytical Sciences - Tập 18 - Trang 1395-1398 - 2002
Isao Kojima1, Yasushi Azuma1, Junhua Xu1, Takayuki Saitou2, So Yonekubo3, Naoko Shimosato4
1Materials Characterization Division, National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki, Japan
2Hokkaido Industrial Research Institute, Sapporo, Japan
3Precision Technology Research Institute of Nagano Prefecture, Okaya, Nagano, Japan
4Industrial Research Institute of Nagano Prefecture, Nagano, Japan

Tài liệu tham khảo

JISK 0146:2002 (ISO14606:2000): Surface chemical analysis—Sputter depth profiling. Optimization using layered systems as reference materials; refer to the standard, which includes many references concerning depth profiling. AIST Today, Vol. 3, GaAs/AlAs Superlattice Reference Material (NIMC CRM 5201-a); regarding the distribution of the reference material, refer to this website: http://www.sasj.gr.jp/. “Bunseki Bunka Kai” is one of the sub-committee of the committee for intellectual infrastructures in the Council of Promotion for Industrial Technology Collaboration. Public testing and research organizations and AIST participate in the “Bunseki Bunka Kai” to exchange information concerning common issues associated with chemical analysis. The first activity of the “Bunseki Bunka Kai” dates back to 1957. This sub committee’s website: http://www.nrlm.go.jp/section/bb_kai/. I. Kojima, N. Fukumoto, T. Fujimoto, B. Q. Li, and H. Takaya, J. Surf. Anal., 1999, 5, 22. T. Fujimoto, B. Li, W. Xu, and I. Kojima, Characterization and Metrology for ULSI Technology, 2000, 586. J. Xu, N. Fukumoto, Y. Azuma, and I. Kojima, J. Surf. Anal., 2002, 9, 353.