Electrochemical and surface analysis study of copper corrosion protection by 1-propanethiol and propyltrimethoxysilane: A comparison with 3-mercaptopropyltrimethoxysilane

Journal of Applied Electrochemistry - Tập 32 - Trang 783-793 - 2002
R. Tremont1, C.R. Cabrera1
1Department of Chemistry, University of Puerto Rico, San Juan, Puerto Rico

Tóm tắt

The inhibition of Cu corrosion by 1-propanethiol (1-PT) and propyltrimethoxysilane (PTS) molecules, in 0.100 mol L−1 KCl solution, was investigated and compared to 3-mercaptopropyltrimethoxysilane (MPS). Corrosion inhibition was studied as a function of the 1-PT and PTS concentration in ethanol, between 1.0 × 10−7 mol L−1 and 1.0 × 10−2 mol L−1. Inhibition efficiency was calculated from Tafel plots in 0.100 mol L−1 KCl solution. It improved with an increase in 1-PT or PTS concentration. The maximum efficiency was obtained at a 1-PT or PTS concentration of 1.0 × 10−3 mol L−1 or 1.0 × 10−5 mol L−1, respectively. Adsorption of 1-PT and PTS on copper followed a Langmuir behaviour. Potentiostatic polarization measurements indicated that 1-PT and PTS are mixed anodic/cathodic inhibitors, in the presence of dissolved oxygen. When the inhibitor exposure time of the pretreated Cu surface in 0.100 mol L−1 KCl solution was varied, a loss on the corrosion inhibition efficiency was observed for the three (MPS, PTS and 1-PT) compounds. However, the 1-PT compound maintained excellent protection in the first 12 h of exposure to a 0.100 mol L−1 KCl solution; afterwards, there was a significant loss in the inhibition efficiency. Surface analysis studies with Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) showed that the inhibitors modified the Cu surface.

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