Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study

Vacuum - Tập 205 - Trang 111424 - 2022
T.C.Q. Noakes1, R. Valizadeh1, A.N. Hannah1, L.B. Jones1, B.L. Militsyn1, S. Mistry2, M.D. Cropper2, A. Rossall3, J.A. Van den Berg3
1ASTeC, STFC Daresbury Laboratory and Cockcroft Institute, Warrington, Cheshire, WA4 4AD, UK
2Department of Physics, Loughborough University, Loughborough, Leicestershire, LE11 3TU, UK
3Ion Beam Centre, School of CSE, University of Huddersfield, Huddersfield, W Yorkshire, HD1 3DH, UK

Tài liệu tham khảo

Seddon, 2017, Short-wavelength free-electron laser sources and science: a review, Rep. Prog. Phys., 80, 10.1088/1361-6633/aa7cca Angal-Kalinin, 2020, Design, specifications, and first beam measurements of the compact linear accelerator for research and applications front end, Phys. Rev. Accel. and Beams, 23, 10.1103/PhysRevAccelBeams.23.044801 Schietinger, 2016, Commissioning experience and beam physics measurements at the SwissFEL injector test facility, Phys. Rev. Accel. and Beams, 19, 10.1103/PhysRevAccelBeams.19.100702 Holland, 1978, Design and operating characteristics of low pressure plasma systems, Vacuum, 28, 437, 10.1016/S0042-207X(78)80018-9 Baker, 1980, Plasma cleaning and the removal of carbon from metal surfaces, Thin Solid Films, 69, 359, 10.1016/0040-6090(80)90588-X Li, 1997, An in-situ XPS study of oxygen plasma cleaning of aluminium surfaces, Surf. Coat. Technol., 92, 171, 10.1016/S0257-8972(97)00079-0 Angal-Kalinin, 2016, Beam characterisation and machine developments at VELA Valizadeh, 2014, The preparation of atomically clean metal surfaces for use as photocathodes in normally conducting RF guns Dowell, 2010, Cathode R&D for future light sources, Nucl. Instrum. Methods Phys. Res., 622, 685, 10.1016/j.nima.2010.03.104 Tromp, 1992, Medium energy ion scattering, vol. 2, 577 Zalm, 2016, Quantitative considerations in medium energy ion scattering depth profiling analysis of nanolayers, Nucl. Instrum. Methods Phys. Res. B, 387, 77, 10.1016/j.nimb.2016.10.004 Mayer, 1997 Biesinger, 2017, Advanced analysis of copper X-ray photoelectron spectra, Surf. Interface Anal., 49, 1325, 10.1002/sia.6239 Tahir, 2012, Electronic and optical properties of Cu, CuO and Cu2O studied by electron spectroscopy, J. Phys. Condens. Matter, 24, 10.1088/0953-8984/24/17/175002 Baer, 2010, Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2, J. Vac. Sci. Technol., A, 28, 1060, 10.1116/1.3456123 Scofield, 1976, Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV, J. Electron. Spectrosc. Relat. Phenom., 8, 129, 10.1016/0368-2048(76)80015-1 Hannah, 2018, Metal photocathodes preparation for compact linear accelerator at Daresbury Laboratory Muñoz-Márquez, 2005, N-induced pseudo-(100) reconstruction of Cu(111): one layer or more?, Surf. Sci., 582, 97, 10.1016/j.susc.2005.03.008 Diaz Leon, 2016, Reflectometry–ellipsometry reveals thickness, growth rate, and phase composition in oxidation of copper, ACS Appl. Mater. Interfaces, 8, 34, 10.1021/acsami.6b06626 Valizadeh, 2013, Preparation of the polycrystalline copper photocathodes for VELA photocathode gun Garcia‐Bosch, 2014, Copper peroxide bioinorganic chemistry: from metalloenzymes to bioinspired synthetic systems Kido, 1999, Anomalous surface peaks observed in the backscattering spectra from amorphous Si and SiO2 films for medium energy He ions, Phys. Rev. Lett., 82, 3352, 10.1103/PhysRevLett.82.3352 Nishimura, 2000, Surface peaks observed for medium energy He ions backscattered from amorphous solids, Surf. Sci., 452, 139, 10.1016/S0039-6028(00)00309-5 Singh, 2014, Relationship between nature of metal-oxide contacts and resistive switching properties of copper oxide thin film based devices, Thin Solid Films, 569, 35, 10.1016/j.tsf.2014.08.030