Electron scattering mechanisms in indium-tin-oxide thin films: grain boundary and ionized impurity scattering

Vacuum - Tập 75 - Trang 275-282 - 2004
Ho-Chul Lee1, O Ok Park2
1Mobile Part, Coating Lab., Samsung Corning Co. Ltd., 644 Jinpyeong-dong, Gumi-si, Gyeongsangbuk-do 730-725, South Korea
2Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, South Korea

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