Effect of chain length of self-assembled monolayers in dip-pen nanolithography using molecular dynamics simulations

Journal of Colloid and Interface Science - Tập 361 - Trang 316-320 - 2011
Cheng-Da Wu1, Te-Hua Fang1, Jen-Fin Lin2
1Department of Mechanical Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, Taiwan
2Department of Mechanical Engineering, National Cheng Kung University, Tainan 701, Taiwan

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