Laser applications in thin-film photovoltaics

Applied Physics B - Tập 100 - Trang 427-436 - 2010
R. Bartlome1, B. Strahm1, Y. Sinquin1, A. Feltrin1, C. Ballif1
1Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel, Switzerland

Tóm tắt

We review laser applications in thin-film photovoltaics (thin-film Si, CdTe, and Cu(In,Ga)Se2 solar cells). Lasers are applied in this growing field to manufacture modules, to monitor Si deposition processes, and to characterize opto-electrical properties of thin films. Unlike traditional panels based on crystalline silicon wafers, the individual cells of a thin-film photovoltaic module can be serially interconnected by laser scribing during fabrication. Laser scribing applications are described in detail, while other laser-based fabrication processes, such as laser-induced crystallization and pulsed laser deposition, are briefly reviewed. Lasers are also integrated into various diagnostic tools to analyze the composition of chemical vapors during deposition of Si thin films. Silane (SiH4), silane radicals (SiH3, SiH2, SiH, Si), and Si nanoparticles have all been monitored inside chemical vapor deposition systems. Finally, we review various thin-film characterization methods, in which lasers are implemented.

Tài liệu tham khảo

R.M. Swanson, Prog. Photovolt. 14(5), 443 (2006) Photon Int. 170–206 (2009) D. Bonnet, Thin Solid Films 361, 547 (2000) S. Nakano, T. Matsuoka, S. Kiyama, H. Kawata, N. Nakamura, Y. Nakashima, S. Tsuda, H. Nishiwak, M. Ohnishi, I. Nagaoka, Y. Kuwano, Jpn. J. Appl. Phys. 25(12), 1936–1943 (1986) K. Brecl, M. Topic, F. Smole, Prog. Photovolt. 13(4), 297 (2005) A.G. Aberle, Thin Solid Films 517(17), 4706 (2009) A.V. Shah, H. Schade, M. Vanecek, J. Meier, E. Vallat-Sauvain, N. Wyrsch, U. Kroll, C. Droz, J. Baillat, Prog. Photovolt., Res. Appl 12, 113 (2004). doi:10.1002/pip.533 A.D. Compaan, I. Matulionis, S. Nakade, Opt. Lasers Eng. 34(1), 15 (2000) S. Haas, A. Gordijn, H. Stiebig, Prog. Photovolt. 16(3), 195 (2008) S. Haas, G. Schope, C. Zahren, H. Stiebig, Appl. Phys. A, Mater. Sci. Process. 92(4), 755 (2008) C. Molpeceres, S. Lauzurica, J.L. Ocana, J.J. Gandia, L. Urbina, J. Carabe, J. Micromech. Microeng. 15(6), 1271 (2005) C. Molpeceres, S. Lauzurica, J.J. Garcia-Ballesteros, M. Morales, S. Fernandez-Robledo, J.L. Ocana, J.J. Gandia, J. Carabe, F. Villar, J. Escarre, J. Bertomeu, J. Andreu, Appl. Surf. Sci. 254(4), 1115 (2007) J. Bohland, A. McMaster, S. Henson, J. Hanak, Specific PVMaT R&D in CdTe product manufacturing—final subcontract report, March 2003. Subcontractor report NREL/SR-520-35177, National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401-3393, January 2004 D. Ruthe, K. Zimmer, T. Hoche, Appl. Surf. Sci. 247(1–4), 447 (2005) J. Hermann, M. Benfarah, G. Coustillier, S. Bruneau, E. Axente, J.F. Guillemoles, M. Sentis, P. Alloncle, T. Itina, Appl. Surf. Sci. 252(13), 4814 (2006) D. Bäuerle, Laser Processing and Chemistry, 3rd edn. (Springer, Berlin, 2000) P. Dittrich, R. Bartlome, G. Montemezzani, P. Gunter, Appl. Surf. Sci. 220(1–4), 88 (2003) F. Kessler, D. Herrmann, M. Powalla, Thin Solid Films 480, 491 (2005) A. Vijh, X. Yang, W. Du, X. Deng, Sol. Energy Mater. Sol. Cells 90(16), 2657 (2006) High-precision light—market survey on laser scribers for monolithic integration of thin-film modules. Photon Int. 258–272 (2008) R. Bartlome, Y. Sinquin, S.A. Meyer, C. Ballif, A. Raible, Versatile thin-film photovoltaic laser scribing system, in Proc. of the 24th European Photovoltaic Solar Energy Conference, Hamburg, Germany (2009), pp. 2854–2855 R.B. Bergmann, Appl. Phys. A, Mater. Sci. Process. 69(2), 187 (1999) O. Nast, S.R. Wenham, J. Appl. Phys. 88(1), 124 (2000) M.A. Green, P.A. Basore, N. Chang, D. Clugston, R. Egan, R. Evans, D. Hogg, S. Jarnason, M. Keevers, P. Lasswell, J. O’Sullivan, U. Schubert, A. Turner, S.R. Wenham, T. Young, Sol. Energy 77(6), 857 (2004) G. Andra, J. Bergmann, F. Falk, E. Ose, H. Stafast, Phys. Status Solidi A, Appl. Res. 166(2), 629 (1998) A.A.D.T. Adikaari, S.R.P. Silva, Nano 3(3), 117 (2008) K. Yamamoto, A. Nakashima, T. Suzuki, M. Yoshimi, H. Nishio, M. Izumina, Jpn. J. Appl. Phys. 33(12B), L1751 (1994) B.K. Nayak, M.C. Gupta, Appl. Phys. A, Mater. Sci. Process. 89, 663 (2007) T.H. Her, R.J. Finlay, C. Wu, E. Mazur, Appl. Phys. A, Mater. Sci. Process. 70(4), 383 (2000) K. Matsubara, P. Fons, K. Iwata, A. Yamada, K. Sakurai, H. Tampo, S. Niki, Thin Solid Films 431, 369 (2003) S.K. Pandey, U. Tiwari, R. Raman, C. Prakash, V. Krishna, V. Dutta, K. Zimik, Thin Solid Films 473(1), 54 (2005) P.F. Luo, G.S. Jiang, C.F. Zhu, Chin. J. Chem. Phys. 22(1), 97 (2009) M. Hanabusa, Z.X. Liu, N. Nakamura, H. Hasegawa, Nucl. Instrum. Methods Phys. Res., Sect. B, Beam Interact. Mater. Atoms 121(1–4), 367 (1997) J.P.M. Hoefnagels, Y. Barrell, W.M.M. Kessels, M.C.M. van de Sanden, J. Appl. Phys. 96(8), 4094 (2004) N. Itabashi, N. Nihsiwaki, M. Magane, S. Naito, T. Goto, A. Matsuda, C. Yamada, E. Hirota, Jpn. J. Appl. Phys. 29(3), L505 (1990) P.B. Davies, N.A. Isaacs, S.A. Johnson, D.K. Russell, J. Chem. Phys. 83(5), 2060 (1985) C. Yamada, E. Hirota, Phys. Rev. Lett. 56(9), 923 (1986) J.U. White, J. Opt. Soc. Am. 32(5), 285 (1942) D. Herriott, H. Kogelnik, R. Kompfner, Appl. Opt. 3(4), 523 (1964) R. Bartlome, M. Baer, M.W. Sigrist, Rev. Sci. Instrum. 78(1), 013110 (2007) M.W. Sigrist, R. Bartlome, D. Marinov, J.M. Rey, D.E. Vogler, H. Wachter, Appl. Phys. B, Lasers Opt. 90(2), 289 (2008) Y. Sumiyoshi, K. Tanaka, T. Tanaky, Appl. Surf. Sci. 79/80, 471 (1994) R. Bartlome, A. Feltrin, C. Ballif, Appl. Phys. Lett. 94, 201501 (2009) M.D. Wheeler, S.M. Newman, A.J. Orr-Ewing, M.N.R. Ashfold, J. Chem. Soc. Faraday Trans. 94(3), 337 (1998) G. Berden, R. Peeters, G. Meijer, Int. Rev. Phys. Chem. 19(4), 565 (2000) V. Sanders, Appl. Opt. 16(1), 19 (1977) J.M. Herbelin, J.A. McKay, M.A. Kwok, R.H. Ueunten, D.S. Urevig, D.J. Spencer, D.J. Benard, Appl. Opt. 19(1), 144 (1980) B.A. Paldus, A.A. Kachanov, Can. J. Phys. 83, 975 (2005) W.M.M. Kessels, J.P.M. Hoefnagels, M.H.H. Boogaarts, D.C. Schram, M.C.M. van de Sanden, J. Appl. Phys. 89(4), 2065 (2001) T. Nagai, A.H.M. Smets, M. Kondo, J. Non-Cryst. Solids 354, 2096 (2008) F. Grangeon, C. Monard, J.-L. Dorier, A.A. Howling, Ch. Hollenstein, D. Romanini, N. Sadeghi, Plasma Sources Sci. Technol. 8, 448 (1999) R.M. Roth, K.G. Spears, G. Wong, Appl. Phys. Lett. 45(1), 28 (1984) Y. Matsumi, T. Hayashi, H. Yoshikawa, S. Komiya, J. Vac. Sci. Technol. A 4(3), 1789 (1986) Y. Nozaki, K. Kongo, T. Miyazaki, M. Kitazoe, K. Horii, H. Umemoto, A. Masuda, H. Matsumura, J. Appl. Phys. 88(9), 5437 (2000) M. Hertl, J. Jolly, J. Phys. D, Appl. Phys. 33, 381 (2000) R.M. Roth, K.G. Spears, G.D. Stein, G. Wong, Appl. Phys. Lett. 46(3), 253 (1985) K.G. Spears, T.J. Robinson, R.M. Roth, IEEE Trans. Plasma Sci. 14(2), 179 (1986) Y. Watanabe, M. Shiratani, Y. Kubo, I. Ogawa, S. Ogi, Appl. Phys. Lett. 53(14), 1263 (1988) Y. Watanabe, J. Phys. D, Appl. Phys. 39, R329 (2006) A. Bouchoule, A. Plain, L. Boufendi, J.Ph. Blondeau, C. Laure, J. Appl. Phys. 70(4), 1991–2000 (1991) A.A. Howling, C. Courteille, J.-L. Dorier, L. Sansonnens, Ch. Hollenstein, Pure Appl. Chem. 68(5), 1017 (1996) C. Courteille, Ch. Hollenstein, J.-L. Dorier, P. Gay, W. Schwarzenbach, A.A. Howling, E. Bertran, G. Viera, R. Martins, A. Macarico, J. Appl. Phys. 80(4), 2069 (1996) R. Bartlome, B. Strahm, A. Feltrin, C. Ballif, in Proc. of the 34th IEEE Photovoltaic Specialist Conference, Philadelphia, PA, June 7–12, 2009, paper 103. B. Strahm, C. Hollenstein, Powder formation in SiH4–H2 discharge in large area capacitively-coupled reactor: a study of the combined effect of the inter-electrode distance and pressure. J. Appl. Phys. (2009 in print) L. Boufendi, J. Hermann, A. Bouchoule, B. Dubreuil, E. Stoffels, W.W. Stoffels, M.L. de Giorgi, J. Appl. Phys. 76(1), 148 (1994) L. Boufendi, A. Bouchoule, Plasma Sources Sci. Technol. 3, 262 (1994) K. Durose, S.E. Asher, W. Jaegermann, D. Levi, B.E. McCandless, W. Metzger, H. Moutinho, P.D. Paulson, C.L. Perkins, J.R. Sites, G. Teeter, M. Terheggen, Prog. Photovolt. 12(2–3), 177 (2004) G. Gouadec, P. Colomban, Prog. Cryst. Growth Charact. Mater. 53(1), 1 (2007) E. Bustarret, M.A. Hachicha, M. Brunel, Appl. Phys. Lett. 52(20), 1675 (1988) M. Tzolov, F. Finger, R. Carius, P. Hapke, J. Appl. Phys. 81(11), 7376 (1997) E. Vallat-Sauvain, C. Droz, F. Meillaud, J. Bailat, A. Shah, C. Ballif, J. Non-Cryst. Solids 352(9–20), 1200 (2006) I. Repins, M.A. Contreras, B. Egaas, C. DeHart, J. Scharf, C.L. Perkins, B. To, R. Noufi, Prog. Photovolt. 16(3), 235 (2008) H. Miyazaki, R. Mikami, A. Yamada, M. Konagai, J. Phys. Chem. Solids 64(9–10), 2055 (2003) W. Witte, R. Kniese, M. Powalla, Thin Solid Films 517(2), 867 (2008) S. Komuro, Y. Aoyagi, Y. Segawa, S. Namba, A. Masuyama, D. Kruangam, H. Okamoto, Y. Hamakawa, J. Appl. Phys. 58(2), 943 (1985) G.Z. Yue, D.X. Han, D.L. Williamson, J. Yang, K. Lord, S. Guha, Appl. Phys. Lett. 77(20), 3185 (2000) M. Wagner, I. Dirnstorfer, D.M. Hofmann, M.D. Lampert, F. Karg, B.K. Meyer, Phys. Stat. Sol. A, Appl. Res. 167(1), 131 (1998) I. Dirnstorfer, M. Wagner, D.M. Hofmann, M.D. Lampert, F. Karg, B.K. Meyer, Phys. Stat. Sol. A, Appl. Res. 168(1), 163 (1998) W.K. Metzger, D. Albin, D. Levi, P. Sheldon, X. Li, B.M. Keyes, R.K. Ahrenkiel, J. Appl. Phys. 94(5), 3549 (2003) S. Shirakata, T. Nakada, Thin Solid Films 515(15), 6151 (2007) W.B. Jackson, N.M. Amer, A.C. Boccara, D. Fournier, Appl. Opt. 20(8), 1333 (1981) W.B. Jackson, N.M. Amer, Phys. Rev. B 25(8), 5559 (1982) N. Wyrsch, F. Finger, T.J. McMahon, M. Vanecek, J. Non-Cryst. Solids 137, 347 (1991) O. Breitenstein, M. Langenkamp, F. Altmann, D. Katzer, A. Lindner, H. Eggers, Rev. Sci. Instrum. 71(11), 4155 (2000) O. Breitenstein, J.P. Rakotoniaina, A.S.H. van der Heide, J. Carstensen, Prog. Photovolt. 13(8), 645 (2005) P. Vorasayan, T.R. Betts, A.N. Tiwari, R. Gottschag, Sol. Energy Mater. Sol. Cells 93(6–7), 917 (2009) K. Kushiya, Thin Solid Films 387(1–2), 257 (2001) C. Coluzza, E. Tuncel, J.L. Staehli, P.A. Baudat, G. Margaritondo, J.T. McKinley, A. Ueda, A.V. Barnes, R.G. Albridge, N.H. Tolk, D. Martin, F. Morier-Genoud, C. Dupuy, A. Rudra, M. Ilegems, Phys. Rev. B 46(19), 12834 (1992) K. Nishi, H. Ohyama, T. Suzuki, T. Mitsuyu, T. Tomimasu, Appl. Phys. Lett. 70(26), 3585 (1997) S. Theodoropoulou, D. Papadimitriou, A.G. Mamalis, D.E. Manolakos, R. Klenk, M.C. Lux-Steiner, Semicond. Sci. Technol. 22, 933 (2007) J. Krc, M. Zeman, O. Kluth, E. Smole, M. Topic, Thin Solid Films 426(1–2), 296 (2003) D. Domine, F.-J. Haug, C. Battaglia, C. Ballif, J. Appl. Phys. (2009 in print) J.P.M. Hoefnagels, A.A.E. Stevens, M.G.H. Boogaarts, W.M.M. Kessels, M.C.M. van de Sanden, Chem. Phys. Lett. 360, 189 (2002)