Improvement of a dual frequency sputtering device for higher deposition rates of protective zirconium oxide films on ceramics

Vacuum - Tập 83 - Trang 1364-1367 - 2009
Yasunori Ohtsu1, Yuzuru Hino1, Hiroharu Fujita1, Morito Akiyama2, Ken Yukimura3
1Department of Electrical and Electronic Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan
2Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology, Tosu, Japan
3Department of Electrical Engineering, Doshisha University, Kyoto, Japan

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Vacuum

Tập 83

1364-1367

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