The fabrication of superhydrophobic copper films by a low-pressure-oxidation method

Koch, 2006, Cryst. Growth Des., 6, 2571, 10.1021/cg060035w Wagner, 2003, J. Exp. Bot., 54, 1295, 10.1093/jxb/erg127 Guo, 2007, Plant Sci., 172, 1103, 10.1016/j.plantsci.2007.03.005 Yang, 2008, Chem. Mater., 20, 1233, 10.1021/cm703220r Li, 2007, Langmuir, 23, 2169, 10.1021/la0620758 Li, 2007, Chem. Mater., 19, 5758, 10.1021/cm071738j Lim, 2007, Langmuir, 23, 7981, 10.1021/la700392w Liu, 2008, Nanotechnology, 19, 165604, 10.1088/0957-4484/19/16/165604 Qu, 2007, Adv. Funct. Mater., 17, 593, 10.1002/adfm.200600472 Wang, 2005, ChemPhysChem, 6, 1475, 10.1002/cphc.200500204 Liu, 2007, Electrochim. Acta, 52, 3709, 10.1016/j.electacta.2006.10.059 Pan, 2007, Nanotechnology, 18, 355605, 10.1088/0957-4484/18/35/355605 Guo, 2008, Appl. Phys. Lett., 92, 063104, 10.1063/1.2841666 Xi, 2008, Appl. Phys. Lett., 92, 053102, 10.1063/1.2839403 Chen, 2009, J. Phys. Chem. C, 113, 5396, 10.1021/jp809616d JCPDS Card No. 04-0836. JCPDS Card No. 48-1548. Hou, 2005, Cryst. Growth Des., 5, 1, 10.1021/cg049972z Zhang, 2003, Inorg. Chem., 42, 16 Liu, 2008, J. Appl. Phys., 103, 056104, 10.1063/1.2842405 Feng, 2004, J. Am. Chem. Soc., 126, 62, 10.1021/ja038636o