Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition

Lee, 1997, Thin Solid Films, 302, 25, 10.1016/S0040-6090(96)09581-8 Meng, 1998, Thin Solid Films, 322, 56, 10.1016/S0040-6090(97)00939-5 Kim, 2000, Thin Solid Films, 377/378, 81, 10.1016/S0040-6090(00)01388-2 Habermeier, 1980, Thin Solid Films, 80, 157, 10.1016/0040-6090(81)90218-2 Morris, 1980, J. Appl. Phys., 51, 1847, 10.1063/1.327756 Dislich, 1988, J. Non-Cryst. Solids, 57, 371, 10.1016/0022-3093(83)90425-8 Zheng, 1993, Appl. Phys. Lett., 63, 1, 10.1063/1.109736 Yuanri, 1984, Thin Solid Films, 115, 195, 10.1016/0040-6090(84)90180-9 Coutal, 1996, Thin Solid Films, 288, 248, 10.1016/S0040-6090(96)08824-4 Krokoszinski, 1990, Thin Solid Films, 187, 179, 10.1016/0040-6090(90)90122-T Zhu, 2000, Thin Solid Films, 359, 244, 10.1016/S0040-6090(99)00882-2 Morikawa, 2000, Thin Solid Films, 359, 61, 10.1016/S0040-6090(99)00749-X Lee, 2001, Thin Solid Films, 386, 105, 10.1016/S0040-6090(01)00777-5 Cho, 2000, Thin Solid Films, 368, 111, 10.1016/S0040-6090(99)01107-4 Bae, 2001, Nucl. Instrum. Meth. B, 178, 311, 10.1016/S0168-583X(01)00510-9 Liu, 2002, Europhys. Lett., 59, 606, 10.1209/epl/i2002-00147-6 Shuttleworth, 1980, J. Phys. Chem., 84, 1629, 10.1021/j100449a038 Davis, 1993, Thin Solid Films, 236, 1, 10.1016/0040-6090(93)90632-Y Carvalho, 2000, Surf. Coat. Technol., 124, 70, 10.1016/S0257-8972(99)00619-2 Kim, 2000, Thin Solid Films, 377/378, 103, 10.1016/S0040-6090(00)01392-4 Kim, 2000, J. Appl. Phys., 88, 6021, 10.1063/1.1318368