Additive-effects during plating in acid tin methanesulfonate electrolytes

Electrochimica Acta - Tập 49 - Trang 4303-4311 - 2004
Nicholas M Martyak1, Robert Seefeldt1
1ATOFINA Chemicals, Inc., Thio and Fine Chemicals Division, 900 First Avenue, King of Prussia, PA 19406, USA

Tài liệu tham khảo

F. Lowenheim, Modern Electroplating, John Wiley and Sons, New York, NY, 1974. M. Jordan, The Electrodeposition of Tin and its Alloys, Eugen Leuze, Saulgau, Germany, 1995. J. Abys, K. Murski, Y. Zhang, US Patent 6,267,863 B1 (2001). Goodenough, 1989, Trans. Inst. Metal Finish., 67, 44, 10.1080/00202967.1989.11870839 Stout, 1935, Trans. Electrochem. Soc., 68, 491, 10.1149/1.3493887 G.W. Jernstedt, J.D. Patrick, Canadian Patent 554,016 (1958). Zavarine, 2003, J. Electrochem. Soc., 150, C202, 10.1149/1.1554724 G. Federman, D. Thomson, M. Toben, N. Brown, US Patent US 5174887 A. J.S. Hwang, Environment-Friendly Electronics: Lead-Free Technology, Electrochemical Publications Ltd., Arrowsmith, Bristol, England, 2001. M. Gernon, M. Wu, T. Buszta, P. Janney, Green Chemistry (June) (1997) 127. R. Schetty, Tin whisker studies—experimentation and mechanistic understanding, in: Proceedings of the American Electroplaters and Surface Finishing Society, 2002. K. Whitlaw, J. Crosby, An empirical study into whisker growth of tin and tin alloy electrodeposits, in: Proceedings of the American Electroplaters and Surface Finishing Society, 2002. Esin, 1939, Acta Physicochim. (USSR), 10, 513 A. Izmaylov, Chem. Chem. Tech. (USSR) 4 (1959) 568. P.M.S. Monk, Fundamentals of Electroanalytical Chemistry, J. Wiley and Sons, New York, NY, 2001. E. Gileadi, Electrode Kinetics for Chemists, Chemical Engineers and Materials Scientists, Wiley-VCH Inc., 1993. Kohl, 1982, J. Electrochem. Soc., 129, 1196, 10.1149/1.2124086 Survila, 2002, Trans. Inst. Metal Finish., 80, 85, 10.1080/00202967.2002.11871439 R. Winand, in: Application of Polarization Measurements in the Control of Metal Deposition, Elsevier, New York, NY, 1984, p. 47. N.M. Martyak, to be published (2003). Meibuhr, 1963, J. Electrochem. Soc., 110, 191, 10.1149/1.2425709 Kaneko, 1989, J. Appl. Electrochem., 19, 387, 10.1007/BF01015241 Loshkarev, 1957, Zhur. Fiz. Khim., 21, 219