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Journal of Medicine and Pharmacy","Tạp chí Y Dược học Cần Thơ",{"EN":487,"VI":488},"\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">04\u002F10\u002F2015 Ministry of Information and Communications allowed Can Tho journal of medicine and pharmacy to operate (102 \u002FGP-BTTTT)\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">07\u002F16\u002F2015 Can Tho journal of medicine and pharmacy is internationally recognized: ISSN 2354-1210\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">In 2016, The journal has been included in the list of medical science journals by The State Council for professorship which is awarded a work score of 0-0.5 points for a published article.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Can Tho Journal of Medicine and Pharmacy welcome original works that haven’t been submitted or published in other medical journals. Posts must contain content related to one of the journal’s categories.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">The content published\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">The journal is divided into 3 categories:\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- Scientific research article: are valuable scientific works, which have been researched and accepted.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- Overview of medicine, biology and pharmacy: serving the objective of continuing training in the fields of medicine, biology and pharmacy; to systematize classical and modern knowledge.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- Update information on new knowledge about medicine, biology, pharmacy in the country and in the world.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Scope\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- Publication and introduction of scientific research in the fields:\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">+ Medicine (internal medicine, surgery, pediatrics, obstetrics and gynecology, odonto-stomatology, laboratory, oncology, traditional medicine, nursing).\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">+ Biology (genetics, biotechnology).\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">+ Pharmacology (pharmaceutics, drug quality analysis-control, synthetic pharmaceutical chemistry, biochemistry, pharmacognosy, botany, clinical pharmacy).\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- To enhance the quality of undergraduate, postgraduate education, scientifically researching and meet the necessary treatment in hospital.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- Introducing the updated domestic and oversea information about science technology to promote scientific research and exchanging technology in local, other universities.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">- Exchanging pharmaceutical and medical information for social health developing in the Mekong Delta and Vietnam.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">The object\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Postgraduate students, student of Can Tho University of Medicine and Pharmacy, scientists from schools, research institutes, hospitals, health centers, pharmaceutical companies of the Mekong Delta; other provinces and regions in Vietnam and other country.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Address\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Headquarters of Can Tho Journal of Medicine and Pharmacy, located Scientific Research and International Cooperation Office: 179 Nguyen Van Cu Street, An Khanh Ward, Ninh Kieu District, Can Tho City, Vietnam.\u003C\u002Fspan>\u003C\u002Fp>","\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Ngày 16\u002F7\u002F2015, Tạp chí Y Dược học Cần Thơ được cấp chỉ số quốc tế: ISSN 2354-1210.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Từ tháng 4\u002F2016, Tạp chí đã được Hội đồng Giáo sư ngành Y đưa vào danh sách các tạp chí khoa học Y học được tính điểm công trình 0-0,5 điểm cho một bài báo đăng.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Năm 2020 Tạp chí Y Dược học Cần Thơ đã được phê duyệt vào danh mục của các Hội đồng Giáo sư ngành Dược học được tính điểm công trình 0-0,5 điểm cho một bài báo đăng.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tạp chí Y Dược học Cần Thơ ra 12 số\u002Fnăm, 180-200 trang\u002Fsố.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Từ tháng 12\u002F2022 Tạp chí Y Dược học Cần Thơ là thành viên của hệ thống Crossref và từ tháng 01\u002F2023 tạp chí thực hiện bình duyệt online kín 2 chiều nhằm tăng tính minh bạch, tin cậy của các công trình nghiên cứu khoa học và đảm bảo tốt nhất chất lượng khoa học của bài viết.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tôn chỉ, mục đích và phạm vi của tạp chí\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tôn chỉ và mục đích hoạt động của tạp chí: xuất bản nhằm mục đích phổ biến kết quả từ các đề tài nghiên cứu khoa học; giao lưu trao đổi khoa học, chia sẻ kinh nghiệm, học tập, đồng thời cập nhật thông tin khoa học mới trong các lĩnh vực y, sinh, dược học trong và ngoài nước.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Phạm vi của tạp chí: Tạp chí xuất bản được chia thành 3 chuyên mục: (i) Bài báo nghiên cứu khoa học là kết quả công trình nghiên cứu khoa học có giá trị đã được triển khai nghiên cứu, (ii) Bài tổng quan y, sinh, dược học: phục vụ mục tiêu đào tạo liên tục trong lĩnh vực y, sinh, dược học; nhằm hệ thống hóa những kiến thức kinh điển và hiện đại; (iii) Thông tin cập nhật kiến thức mới về y, sinh, dược học trong nước và trên thế giới.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Chính sách truy cập mở\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tạp chí Y Dược học Cần Thơ áp dụng chính sách truy cập mở đối với các bài báo đã xuất bản đến với độc giả, nhằm mở rộng cơ hội tiếp cận các kết quả nghiên cứu chất lượng cao và tăng cường trao đổi kiến thức. Tạp chí đăng tải trực tuyến (miễn phí) toàn văn các bài báo được công bố trên website của Tạp chí (https:\u002F\u002Ftapchi.ctump.edu.vn).\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Đạo đức xuất bản\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tạp chí Y Dược học Cần Thơ cam kết tuân thủ đạo đức xuất bản phù hợp với các hướng dẫn và tiêu chuẩn của the Committee on Publication Ethics (COPE), tuân thủ các nguyên tắc của COPE’s Core Practices, Best Practices Guidelines for Journal Editors và Guidelines on Good Publication Practices.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Bản thảo bài báo chỉ được chấp nhận khi được tác giả chịu trách nhiệm chính cam kết các nội dung sau: Các nội dung của bản thảo chưa được đăng tải toàn bộ hoặc một phần ở các tạp chí khác; Tất cả các tác giả đều có đóng góp một cách đáng kể vào quá trình nghiên cứu hoặc chuẩn bị bản thảo và cùng chịu trách nhiệm về các nội dung của bản thảo; Tuân thủ các biện pháp đảm bảo đạo đức nghiên cứu (ví dụ thỏa thuận đồng ý tham gia nghiên cứu).\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Cam kết bảo mật\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tạp chí cam kết thực hiện và tuân thủ các quy định của luật và các văn bản hướng dẫn liên quan đến bảo mật thông tin cá nhân trên không gian mạng. Các thông tin mà người dùng (tác giả, độc giả, biên tập viên, người phản biện) nhập vào các biểu mẫu trên Hệ thống Quản lý xuất bản trực tuyến của tạp chí chỉ được sử dụng vào các mục đích đã được tuyên bố rõ ràng và sẽ không được cung cấp cho bất kỳ bên thứ ba nào khác, hay dùng vào bất kỳ mục đích nào khác.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Phí gửi bài\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Lệ phí gửi đăng bài: 1.000.000đ\u002Fbài báo\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Lệ phí gửi đăng nhanh: 1.500.000đ\u002Fbài báo\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Đối với tác giả là cán bộ viên chức thuộc Trường Đại học Y Dược Cần Thơ thì được hỗ trợ 50% lệ phí gửi đăng bài.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Đối với sinh viên thực hiện đề tài nghiên cứu khoa học cấp trường được hỗ trợ 100% lệ phí đăng bài ( Tác giả gửi đính kèm “ Quyết định về việc giao tổ chức thực hiện đề tài nghiên cứu khoa học cấp Trường của sinh viên”).\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Hình thức nộp lệ phí:\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">1. Tiền mặt:\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Nộp trực tiếp tại Phòng Tài chính - Kế toán, Trường Đại học Y Dược Cần Thơ, số 179 Nguyễn Văn Cừ, P. An Khánh, Q. Ninh Kiều, thành phố Cần Thơ.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">2. Chuyển khoản:\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tên Tài khoản: Trường ĐHYD Cần Thơ, Số TK: 0111000115668, tại ngân hàng Vietcombank chi nhánh Cần Thơ.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Thời gian: Áp dụng từ ngày 01\u002F02\u002F2023.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">* Phí gửi bài không được hoàn trả khi bài viết bị từ chối hoặc tác giả xin rút bài viết.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Quy trình phản biện bài báo\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tạp chí Y Dược học Cần Thơ thực hiện quy trình phản biện kín hai chiều nghiêm ngặt. Danh tính của những người phản biện không được tiết lộ cho các tác giả và ngược lại. Quy trình thẩm định bài báo đăng gồm các bước sau:\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tiếp nhận bản thảo\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Tác giả liên hệ gửi bản thảo đến Tạp chí qua hệ thống trực tuyến tại website: https:\u002F\u002Ftapchi.ctump.edu.vn. Hướng dẫn về cách đăng ký, gửi bài và chuẩn bị bản thảo được cung cấp trên website của Tạp chí.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Sàng lọc sơ bộ\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Sau khi Tòa soạn nhận được bài báo của tác giả, Ban Thư ký sẽ tiến hành kiểm tra sơ bộ bài báo (các yêu cầu về nội dung và hình thức). Những bài báo không đúng quy cách hoặc có nội dung không phù hợp hoặc vi phạm bản quyền sẽ bị từ chối (Ban Thư ký thông báo phản hồi đến tác giả trong vòng 1 tuần). Những bài báo đủ điều kiện, được Ban Thư ký tòa soạn chuyển đến Ban Biên tập có cùng chuyên môn với nội dung bài báo để đề xuất người phản biện. Thời gian kể từ khi Ban Biên tập nhận bài báo đến khi đề xuất người phản biện bài báo chậm nhất là 5 ngày.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Vòng phản biện\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">1. Ban Thư ký gửi bài và yêu cầu phản biện đến 02 phản biện độc lập.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">2. Các phản biện gởi nhận xét cho Ban Thư ký. Thời gian từ khi gửi bài cho phản biện đến khi nhận ý kiến của phản biện tối đa là 20 ngày.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Xử ký kết quả phản biện\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">1. Nếu ý kiến đồng ý cho đăng và không cần chỉnh sửa, Ban Thư ký tiếp tục đăng bài theo qui trình.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">2. Nếu ý kiến đồng ý đăng và cần chỉnh sửa, Ban Thư ký sẽ thông tin đến tác giả chỉnh sửa theo yêu cầu của người phản biện. Thời gian chỉnh sửa và gửi lại kéo dài không quá 2 tuần, từ khi tác giả bài báo nhận được thông tin (Quá trình này có thể lặp lại tối đa 2 lần\u002F1 bài báo). Khi có sự thống nhất, đồng ý của người phản biện; bài báo được tiếp tục đăng theo qui trình.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">3. Những bài báo có chất lượng không đạt yêu cầu, cả 2 phản biện không đồng ý cho đăng sẽ bị Tòa soạn từ chối đăng.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">Xuất bản\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">1. Ban Thư ký tổng hợp các bản thảo đã được tác giả hoàn thiện sau thẩm định trình Ban Biên tập xem xét, Tổng Biên tập phê duyệt, quyết định bài đăng theo các tiêu chí: sự phù hợp nội dung với tôn chỉ và mục đích, thể loại bài viết (ưu tiên các bài có bài có nghiên cứu chuyên sâu, hàm lượng khoa học cao), đóng góp mới bài báo, bài báo được ưu tiên đăng trong số gần nhất của Tạp chí theo thứ tự: tính thời sự, chất lượng bài báo và thời gian gửi bài.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">2. Ban Biên tập và Ban Thư ký biên tập bản thảo, chế bản, đọc rà soát lỗi. Thời gian hoàn thành từ 10-15 ngày.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">3. Ban Thư ký có trách nhiệm thông báo cho tác giả bài báo (bằng e-mail) về tình hình phê duyệt bài báo, thời gian, số kỳ, tập xuất bản bài báo theo qui định.\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>\u003Cp>\u003Cspan style=\"color: rgb(0, 0, 0);\">4. Danh sách bài báo theo số Tạp chí được in ấn và phát hành trong năm định kỳ được công bố chính thức trên website: https:\u002F\u002Ftapchi.ctump.edu.vn\u003C\u002Fspan>\u003C\u002Fp>\u003Cp>\u003Cbr>\u003C\u002Fp>",{"VOID":490},"wcQ1uqwAAAAJ","2023-05-30T08:17:21.868+00:00",[],[494],{"id":495,"createTime":28,"updateTime":28,"relativeEntities":496,"slug":28,"properties":497,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":507,"parentIds":508,"statistic":28},"6413896b-eca9-442b-a73f-182a58a0ce40",[],{"title":498,"address":501,"country":504,"abbreviation":505},{"EN":499,"VI":500},"Can Tho University of Medicine and Pharmacy","Trường Đại học Y Dược Cần Thơ",{"EN":502,"VI":503},"No 179, Nguyen Van Cu street, An Khanh ward, Ninh Kieu district, Can Tho city, Vietnam","Số 179, đường Nguyễn Văn Cừ, phường An Khánh, quận Ninh Kiều, thành phố Cần Thơ, Việt Nam",{"VOID":15},{"VOID":506},"ctump","http:\u002F\u002Fwww.ctump.edu.vn\u002F",[],[],"https:\u002F\u002Ftapchi.ctump.edu.vn\u002Findex.php\u002Fctump",{"impactFactor":32,"impactFactorByYear":512,"i10Index":32,"i10IndexLast5Year":32,"totalPublication":514,"totalPublicationByYear":515,"totalCitation":520,"totalCitationByYear":521,"totalCitationPerPublication":108,"totalCitationPerPublicationByYear":523,"hindexLast5Year":45,"hindex":45},{"2022":513,"2023":111,"2024":106},0.01,1556,{"2020":47,"2021":516,"2022":517,"2023":518,"2024":519,"2025":122},57,306,801,358,161,{"2021":146,"2022":280,"2023":522},99,{"2021":524,"2022":318,"2023":104},0.23,{"impactFactor":28,"impactFactorByYear":28,"i10Index":123,"i10IndexLast5Year":123,"totalPublication":526,"totalPublicationByYear":527,"totalCitation":526,"totalCitationByYear":528,"totalCitationPerPublication":40,"totalCitationPerPublicationByYear":531,"hindexLast5Year":49,"hindex":49},476,{"0":205,"2019":123,"2021":139,"2022":459,"2023":451,"2024":357,"2025":49,"2026":48},{"2021":42,"2022":123,"2023":161,"2024":529,"2025":360,"2026":530},136,83,{"2021":105,"2022":513,"2023":532,"2024":127,"2025":533,"2026":534},0.62,25.43,13.83,{"id":536,"createTime":537,"updateTime":382,"relativeEntities":538,"slug":539,"properties":540,"entityType":25,"verifyStatus":26,"verifyTime":28,"verifyNote":28,"languages":552,"translateLanguages":28,"viewCount":133,"subjectFields":553,"manageAffiliations":554,"indexDatabases":555,"url":556,"thumbnailPath":557,"statistic":558,"gsStatistic":594,"type":55,"analyzePriority":28},"6984a56a-db70-403b-9cc4-4013e1ceaffa","2023-05-09T06:47:40.346+00:00",[],"T%E1%BA%A1p%20ch%C3%AD%20Nghi%C3%AAn%20c%E1%BB%A9u%20n%C6%B0%E1%BB%9Bc%20ngo%C3%A0i",{"country":541,"issn":542,"title":544,"introduce":547,"gsId":550},{"VOID":15},{"VOID":543},"25252445",{"EN":545,"VI":546},"VNU Journal of Foreign Studies","Tạp chí Nghiên cứu nước ngoài",{"EN":548,"VI":549},"{\"ops\":[{\"insert\":\"\\n\\nThe \\n\"},{\"attributes\":{\"italic\":true},\"insert\":\"VNU Journal of Science\"},{\"insert\":\"\\n was established in 1985 for the publication of national and international research papers in all fields of natural sciences and technology, social sciences and humanities. 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current status of plasma-catalysis research and the associated possible applications are outlined. A basic explanation of plasma chemistry is given, which is then used as a foundation to indicate the research vector for the ongoing development of various applications. As an example of an environmental application, volatile organic compound decomposition using plasma-catalysis is discussed in depth, from the fundamental concept to the current industrial application status. As a potential application of plasma-catalysis towards the realization of a future “hydrogen society”, ammonia synthesis is discussed in terms of current social attitudes and regulations, along with historical developments. Additionally, up-to-date information on the fundamentals of the nonthermal plasma interaction with a catalyst is provided.",{"EN":1024},"Plasma Catalysis for Environmental Treatment and Energy Applications",{"VOID":1026},"Mizuno A, Clements JS, Davis RH (1986) IEEE Trans Ind Appl 22(3):516–522\nClements JS, Mizuno A, Finney WC, Davis RH (1989) IEEE Trans. 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US. 6,471,932 B1",{"VOID":1028},"10.1007\u002Fs11090-015-9652-7","PUBLICATION","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002Fs11090-015-9652-7",[1032,1048,1061,1074,1087],{"id":1033,"sortIndex":32,"researcher":28,"roles":1034,"affiliations":1036,"properties":1045},"f77b0a2d-64ed-4679-94fc-c3695d8497d8",[1035],"AUTHOR",[1037],{"id":1038,"sortIndex":32,"affiliation":1039,"properties":28},"711de312-6fcf-4c12-b7a9-a83182cff422",{"id":1038,"createTime":28,"updateTime":28,"relativeEntities":1040,"slug":28,"properties":1041,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1044,"statistic":28},[],{"title":1042},{"EN":1043},"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan",[],{"title":1046},{"VI":1047},"Hyun-Ha 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Nanba","ARTICLE",{"url":1030,"publisher":1104,"properties":1157},{"id":868,"createTime":869,"updateTime":870,"relativeEntities":1105,"slug":872,"properties":1106,"entityType":25,"verifyStatus":882,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":32,"subjectFields":1110,"manageAffiliations":1126,"indexDatabases":1137,"url":28,"thumbnailPath":28,"statistic":1152,"gsStatistic":28,"type":55,"analyzePriority":28},[],{"issn":1107,"title":1108,"eissn":1109},{"VOID":877},{"EN":879},{"VOID":875},[1111,1115,1119,1123],{"id":885,"createTime":28,"updateTime":28,"relativeEntities":1112,"label":1113,"description":1114,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":888},{},{"id":891,"createTime":28,"updateTime":28,"relativeEntities":1116,"label":1117,"description":1118,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":894},{},{"id":897,"createTime":28,"updateTime":28,"relativeEntities":1120,"label":1121,"description":1122,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":900},{},{"id":903,"createTime":28,"updateTime":28,"relativeEntities":1124,"label":1125,"description":28,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":906},[1127,1132],{"id":909,"createTime":28,"updateTime":28,"relativeEntities":1128,"slug":28,"properties":1129,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1131,"statistic":28},[],{"title":1130},{"EN":913},[],{"id":916,"createTime":28,"updateTime":28,"relativeEntities":1133,"slug":28,"properties":1134,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1136,"statistic":28},[],{"title":1135},{"EN":920},[922],[1138,1145],{"id":925,"indexDatabase":1139,"url":931,"indexYears":932,"academicFieldIds":1144,"indexDatabaseRanking":938},{"id":775,"createTime":28,"updateTime":28,"relativeEntities":1140,"label":1141,"description":1142,"key":781,"publicationTags":1143,"standard":28},[],{"EN":778,"VI":778},{"EN":778,"VI":780},[783],[934,935,936,937],{"id":940,"indexDatabase":1146,"url":952,"indexYears":28,"academicFieldIds":1151,"indexDatabaseRanking":28},{"id":942,"createTime":28,"updateTime":28,"relativeEntities":1147,"label":1148,"description":1149,"key":949,"publicationTags":1150,"standard":28},[],{"EN":945,"VI":945},{"EN":947,"VI":948},[951,813],[954,955],{"impactFactor":32,"impactFactorByYear":1153,"i10Index":961,"i10IndexLast5Year":127,"totalPublication":962,"totalPublicationByYear":1154,"totalCitation":965,"totalCitationByYear":1155,"totalCitationPerPublication":979,"totalCitationPerPublicationByYear":1156,"hindexLast5Year":201,"hindex":201},{"2012":194,"2013":422,"2014":223,"2015":347,"2016":958,"2017":840,"2018":462,"2019":115,"2020":119,"2021":440,"2022":959,"2023":960},{"1981":130,"1982":51,"1983":129,"1984":51,"1985":128,"1986":134,"1987":122,"1988":135,"1989":138,"1990":140,"1991":135,"1992":131,"1993":122,"1994":146,"1995":138,"1996":133,"1997":199,"1998":128,"1999":134,"2000":129,"2001":199,"2002":134,"2003":140,"2004":127,"2005":132,"2006":148,"2007":142,"2008":147,"2009":132,"2010":279,"2011":280,"2012":567,"2013":162,"2014":158,"2015":688,"2016":688,"2017":428,"2018":280,"2019":516,"2020":516,"2021":50,"2022":436,"2023":964,"2024":135},{"1981":160,"1982":967,"1983":602,"1984":278,"1985":613,"1986":149,"1987":334,"1988":162,"1989":968,"1990":161,"1991":152,"1992":69,"1993":613,"1994":330,"1995":969,"1996":280,"1997":280,"2004":574,"2005":970,"2006":971,"2007":281,"2008":360,"2009":206,"2010":972,"2011":280,"2012":973,"2013":616,"2014":276,"2015":974,"2016":578,"2017":975,"2018":976,"2019":977,"2020":602,"2021":978,"2022":688,"2023":127,"2024":123},{"1981":593,"1982":981,"1983":982,"1984":464,"1985":983,"1986":984,"1987":985,"1988":986,"1989":987,"1990":988,"1991":838,"1992":989,"1993":990,"1994":991,"1995":992,"1996":993,"1997":994,"2004":995,"2005":996,"2006":997,"2007":998,"2008":999,"2009":235,"2010":1000,"2011":40,"2012":1001,"2013":1002,"2014":1003,"2015":1004,"2016":1005,"2017":1006,"2018":1007,"2019":1008,"2020":1009,"2021":1010,"2022":1011,"2023":194,"2024":108},{"pages":1158,"volume":1160},{"VOID":1159},"45-72",{"VOID":1161},"36","2015-10-16",2015,[951,938],false,{"id":1167,"createTime":1168,"updateTime":1169,"relativeEntities":1170,"slug":1171,"properties":1172,"entityType":1029,"verifyStatus":26,"verifyTime":1181,"verifyNote":1182,"languages":28,"translateLanguages":28,"viewCount":32,"primaryUrl":1183,"fullTextUrl":28,"authors":1184,"publicationType":1102,"publisherRelationship":1248,"citationCount":28,"citationInfo":28,"publishDate":1307,"publishYear":1308,"citationAnalyzeStatus":882,"lastCitationAnalyze":28,"indexDatabases":1309,"openAccess":28,"references":28,"isForceReanalyzing":1165},"00270406-0340-4b4e-9fd1-9a8b5901280a","2024-01-21T12:33:06.241+00:00","2025-01-22T02:50:05.911+00:00",[],"Preparation-of-Silicon-Nanopowder-by-Recycling-Silicon-Wafer-Waste-in-Radio-Frequency-Thermal-Plasma-Process",{"abstract":1173,"title":1175,"references":1177,"doi":1179},{"EN":1174},"Silicon nanopowders were prepared from silicon waste by using radio-frequency thermal plasma. Silicon waste, generated from the manufacturing process of silicon wafers, was pulverized to form micrometer-sized silicon starting powder. In order to obtain as much silicon nanopowder as possible from thermal plasma processing, the enhancement of vaporization and the quenching rate of the silicon starting powder were considered as major factors. A counter-flow injection apparatus (CFIA) was introduced for improved vaporization and homogeneous nanoparticles. It was designed to inject argon as a quenching gas in the direction opposite the thermal plasma flame flow. The controlled location of the CFIA injection nozzle and the flow rate of the quenching gas affect the residence time of the injected staring powder by recirculating flow and the vapor density by gas mixing. The variation of the flow pattern inside the reactor and the characteristics of the products were investigated to determine the optimal processing environment to prepare uniform and small silicon nanopowder particles. The environment was defined by two parameters: the flow rate of the counter quenching gas and the distance between the torch and CFIA nozzles. The flow rate of the quenching gas was controlled from 30 to 70 L\u002Fmin. The distance between the torch and CFIA nozzles was adjusted from 150 to 350 mm. When the quenching gas flow rate of 70 L\u002Fmin and the distance of 350 mm were applied, the uniform and smallest silicon nanopowders were obtained.",{"EN":1176},"Preparation of Silicon Nanopowder by Recycling Silicon Wafer Waste in Radio-Frequency Thermal Plasma Process",{"VOID":1178},"De Sousa M, Vardelle A, Mariaux G, Vardelle M, Michon U, Beudin V (2016) Use of a thermal plasma process to recycle silicon kerf loss to solar-grade silicon feedstock. Sep Purif Technol 161:187–192\nWang TY, Lin YC, Tai CY, Sivakumar R, Rai DK, Lan CW (2008) A novel approach for recycling of kerf loss silicon from cutting slurry waste for solar cell applications. J Cryst Growth 310:3403–3406\nDong A, Zhang L, Damoah LNW (2011) Beneficial and technological analysis for the recycling of solar grade silicon wastes. JOM 63:23–27\nLin YC, Wang TY, Lan CW, Tai CY (2010) Recovery of silicon powder from kerf loss slurry by centrifugation. Powder Technol 200:216–223\nSo KS, Lee H, Kim TH, Choi S, Park DW (2014) Synthesis of silicon nanopowder from silane gas by RF thermal plasma. Phys Status Solidi A 211:310–315\nMangolini L, Thimsen E, Kortshagen U (2005) High-yield plasma synthesis of luminescent silicon nanocrystals. Nano Lett 5:655–659\nLeblanc D, Hovington P, Kim C, Guerfi A, Bélanger D, Zaghib K (2015) Silicon as anode for high-energy lithium ion batteries: from molten ingot to nanoparticles. J Power Sour 299:529–536\nTerekhov VA, Kashkarov VM, Turishchev SYu, Pankov KN, Volodin VA, Efremov MD, Marin DV, Cherkov AG, Goryainov SV, Korchagin AI, Cherepkov VV, Lavrukhin AV, Fadeev SN, Salimov RA, Bardakhanov SP (2008) Structure and optical properties of silicon nanopowders. Mater Sci Eng, B 147:222–225\nWatanabe T, Itoh H, Ishii Y (2001) Preparation of ultrafine particles of silicon base intermetallic compound by arc plasma method. Thin Solid Films 390:44–50\nAskari S, Levchenko I, Ostrikov K, Maguire P, Mariotti D (2014) Crystalline Si nanoparticles below crystallization threshold: effects of collisional heating in non-thermal atmospheric-pressure microplasmas. Appl Phys Lett 104:163103\nChaudhary AL, Sheppard DA, Paskevicius M, Saunders M, Buckley CE (2014) Mechanochemical synthesis of amorphous silicon nanoparticles. RSC Adv 4:21979–21983\nBley RA, Kauzlarich SM (1996) A low-temperature solution phase route for the synthesis of silicon nanoclusters. J Am Chem Soc 118:12461–12462\nWilcoxon JP, Samara GA, Provencio PN (1999) Optical and electronic properties of Si nanoclusters synthesized in inverse micelles. Phys Rev B 60:2704–2714\nZou J, Sanelle P, Pettigrew KA, Kauzlarich SM (2006) Size and spectroscopy of silicon nanoparticles prepared via reduction of SiCl4. J Clust Sci 17:565–578\nEslamian M, Rak J, Ashgriz N (2008) Preparation of aluminum\u002Fsilicon carbide metal matrix composites using centrifugal atomization. Powder Technol 184:11–20\nHicks EM, Zou S, Schatz GC, Spears KG, Duyne RPV (2005) Controlling plasmon line shapes through diffractive coupling in linear arrays of cylindrical nanoparticles fabricated by electron beam lithography. Nano Lett 5:1035–1070\nSato S, Swihart MT (2006) Propionic-acid-terminated silicon nanoparticles: synthesis and optical characterization. Chem Mater 18:4083–4088\nVollath D (2008) Plasma synthesis of nanopowders. J Nanopart Res 10:39–57\nOstrikov K, Neyts EC, Meyyappan M (2013) Plasma nanoscience: from nano-solids in plasmas to nano-plasmas in solids. Adv Phys 62:113–224\nShinoda K, Murakami H, Sawabe Y, Saegusa K (2012) Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet. Chem Eng J 198:61–64\nYasar-Inceoglu O, Lopez T, Farshihagro E, Mangolini L (2012) Silicon nanocrystal production through non-thermal plasma synthesis: a comparative study between silicon tetrachloride and silane precursors. Nanotechnology 23:255604–255613\nColombo V, Ghedini E, Gherardi M, Sanibondi P, Shigeta M (2012) A two-dimensional nodal model with turbulent effects for the synthesis of Si nano-particles by inductively coupled thermal plasmas. Plasma Sour Sci Technol 21:025001\nColombo V, Ghedini E, Gherardi M, Sanibondi P (2013) Evaluation of precursor evaporation in Si nanoparticle synthesis by inductively coupled thermal plasmas. Plasma Sour Sci Technol 22:035010\nLi JG, Ikeda M, Ye R, Moriyoshi Y, Ishigaki T (2007) Control of particle size and phase formation of TiO2 nanoparticles synthesized in RF induction plasma. J Phys D Appl Phys 40:2348–2353\nLeparoux M, Loher M, Schreuders C, Siegmann S (2008) Neural network modelling of the inductively coupled RF plasma synthesis of silicon nanoparticles. Powder Technol 185:109–115\nPaik S, Chen X, Kong P, Pfender E (1991) Modeling of a counterflow plasma reactor. Plasma Chem Plasma Process 11:229–249\nOr TW, Kong PC, Pfender E (1992) Counter-flow liquid injection plasma synthesis of spinel powders. Plasma Chem Plasma Process 12:189–201",{"VOID":1180},"10.1007\u002Fs11090-017-9814-x","2025-01-22T02:50:05.910+00:00","Auto Verify","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002Fs11090-017-9814-x",[1185,1200,1222,1235],{"id":1186,"sortIndex":32,"researcher":28,"roles":1187,"affiliations":1188,"properties":1197},"8b2fd2d0-1b90-4c1a-be35-6b39185d96bb",[1035],[1189],{"id":1190,"sortIndex":32,"affiliation":1191,"properties":28},"104b59e4-8697-42b9-9a90-f13023d5be08",{"id":1190,"createTime":28,"updateTime":28,"relativeEntities":1192,"slug":28,"properties":1193,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1196,"statistic":28},[],{"title":1194},{"VI":1195},"Department of Chemistry and Chemical Engineering and Regional Innovation Center for Environmental Technology of Thermal Plasma (RIC-ETTP), Inha University, Incheon, Republic of Korea",[],{"title":1198},{"VI":1199},"SeungJun 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Reaction-of-C5-Perfluorinated-Ketone-C5-PFK-Theoretical-Kinetics-Studies",{"abstract":1317,"title":1319,"references":1321,"doi":1323},{"EN":1318},"In this research, the elementary process of thermal unimolecular decomposition of C5-PFK, as an alternative molecule for SF6, is studied theoretically. The energies of the reactants, transition states and products of the reaction are computed by the combination CBS-QB3 method. Next, the rate coefficients for the formation of various products at different temperatures and pressures are calculated by statistical rate theories such as RRKM and master equation formalism. For the bond dissociation processes, the rate coefficients are calculated by variable reaction coordinate-transition state theory (VRC-TST) which is a flexible transition-state version of RRKM theory. It is found that C–C bond dissociation processes and decomposition to C3F6 + CF3COF are main product channels. At temperature 500 K, the branching ratio of product channel C3F6 + CF3COF is calculated to be about 25%. However, as temperature increases, the branching ratio of the latter reaction deceases to reach a value of about 0.5% at 2000 K. The major product channel at all conditions is dissociation to CF3CFCF3 + CF3C(O).",{"EN":1320},"Multichannel Gas-Phase Unimolecular Decomposition Reaction of C5-Perfluorinated Ketone, C5-PFK: Theoretical Kinetics Studies",{"VOID":1322},"Zhong L, Rong M, Wang X, Wu J, Han G, Lu Y, Yang A, Wu Y (2017) AIP Adv 7:075003\nXiao S, Li Y, Zhang X, Tian S, Deng Z, Tang J (2017) AIP Adv 7:065017\nPreve C, Maladen R, Piccoz D (2016) IEEE Int Conf Dielectr 1:235–240\nBoggs SA (1989) IEEE Elect Insul Mag 5:16–21\nFang X, Hu X, Greet JM, Wu J, Han J, Su S, Zhang J, Hu J (2013) Environ Sci Technol 47:3848–3855\nKo M, Sze N, Wang W-C, Shia G, Goldman A, Murcray F, Murcray D, Rinsland C (1993) J Geophys Res 98:10499–10507\nBeroual A, Haddad AM (2017) Energies 10:1216\nLi X, Zhao H, Murphy AB (2018) J Phys D Appl Phys 51:153001\nOkubo H, Beroual A (2011) IEEE Electr Insul Mag 27:34–42\nPreve C, Piccoz D, Maladen R, Biasse JM (2016) CIGRE. pp D1–205‏\nMantilla JD, Gariboldi N, Grob S, Claessens M (2014) In: 2014 IEEE electrical insulation conference (EIC) pp 469–473\nSimka P, Ranjan N (2015) In: 19th International symposium on high voltage engineering pp 23–28\nHyrenbach M, Hintzen T, Müller P, Owens J (2015) In: 23rd Int In Conf on Electricity Distribution (Lyon,) p 587\nTatarinov AV, Bilera IV, Avtaeva SV, Shakhatov VA, Solomakhin PV, Maladen R, Prévé C, Piccoz D (2015) Plasma Chem Plasma Process 35:845–862\nHyrenbach M, Paul TA, Owens J (2017) CIRED-Open Access Proc J 1:132–135\nSaxegaard M, Kristoffersen M, Stoller P, Seege, M, Hyrenbach M, Landsverk H (2015) CIRED Paper 926\nFu Y, Wang X, Li X, Yang A, Han G, Lu Y, Wu Y, Rong M (2016) AIP Adv 6:085305\nZhang X, Li Y, Xiao S, Tang J, Tian S, Deng Z (2017) Environ Sci Technol 51:10127–10136\nZhang X, Li Y, Tian S, Xiao S, Chen D, Tang J, Zhuo R (2018) Chem Eng J 336:38–46\nChen L, Li X, Xiong J, Murphy AB, Fu M, Zhuo R (2018) J Phys D Appl Phys 51:435202\nMontgomery JA Jr, Frisch MJ, Ochterski JW, Petersson GA (1999) J Chem Phys 110:2822–2827\nBecke AD (1993) J Chem Phys 98:5648–5652\nLee C, Yang W, Parr RG (1988) Phys Rev B 37:785–789\nFrisch MJ, Trucks GW, Schlegel HB, Scuseria GE, Robb MA, Cheeseman JR, Scalmani G, Barone V, Mennucci B, Petersson GA, Nakatsuji H, Caricato M, Li X, Hratchian HP, Izmaylov AF, Bloiono J, Zheng G, Sonneberg JL, Hada M, Ehara M, Toyota K, Fukuda R, Hasegawa J, Ishida M, Nakajima T, Honda Y, Kitao O, Nakai H, Vreven T Jr, Montgomery JA, Peralta JE, Ogliaro F, Bearpark M, Heyd JJ, Brothers E, Kudin KN, Staroverov VN, Kobayashi R, Normand K, Raghavachari J, Rendell A, Burant CJ, Iyengar SS, Tomasi J, Cossi M, Rega N, Millam JM, Klene M, Knox JE, Cross JB, Bakken V, Adamo C, Jaramillo J, Gomperts R, Stratmann RE, Yazyev O, Austin AJ, Cammi R, Pomelli C, Ochterski JW, Martin LR, Morokuma K, Zakrzewski VGG, Voth A, Salvador P, Dannenberg JJ, Dapprich S, Daniels AD, Farkas Ö, Foresman JB, Ortiz JV, Cioslowski J, Fox DJ (2009) Gaussian 09 A1 Revision. Gaussian Inc, Wallingford\nHolbrook KA, Pilling MJ, Robertson SJ (1996) Unimlecular reactions. John Wiley & Sons Inc, Chichester\nGilbert RG, Smith SC (1990) Theory of unimolecualr and recombination reactions. Blackwell Scientific, Oxford\nTroe J (1977) J Chem Phys 66:4745–4757\nSeakins PW, Robertson SH, Pilling MJ, Slagle IR, Gmurczyk GW, Bencsura A, Gutman D, Tsang W (1993) J Phys Chem 97:4450–4458\nFernández-Ramos A, Ellingson BA, Meana-Pañeda R, Marques JMC, Truhlar DG (2007) Theor Chem Account 118:813–826\nKlippenstein SJ (1990) Chem Phys Lett 170:71–77\nKlippenstein SJ (1994) J Phys Chem 98:11459–11464\nWardlaw DM, Marcus RA (1986) J Phys Chem 90:5383–5393\nWardlaw DM, Marcus RA (1984) Chem Phys Lett 110:230–234\nKlippenstein SJ, Khundkar LR, Zewail AH, Marcus RA (1988) J Phys Chem 89:4761–4770\nKlippenstein SJ (1991) J Phys Chem 94:6469–6482\nKlippenstien SJ, Wagner AF, Dunbar RC, Wardlaw DM, Robertson SH (1999) VARIFLEX program, Version 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lasmalysis-or-Sonolysis",{"abstract":1424,"title":1426,"references":1428,"doi":1430},{"EN":1425},"The trichloromethylation of C60 fullerene was achieved either under plasmalysis conditions, i.e. by arcing a solution of C60 in CCl4 between two graphite electrodes, or by sonolysis of C60 in CCl4. The resulting products were studied by UV–VIS and FT-IR spectroscopy as well as by thermogravimetric analysis in comparison to the trichloromethyl adducts formed by radiolysis or photolysis of C60 in CCl4. A reference study on the plasmalysis of pure CCl4 has revealed the formation of carbon soot and hexachlorobenzene. The formation of the latter compound was suppressed when C60 was present in CCl4.",{"EN":1427},"Fullerene C60 Trichloromethylation Through CCl4 Plasmalysis or Sonolysis",{"VOID":1429},"Krusic PJ, Wasserman E, Keizer PN, Morton JM, Preston KF (1991) Science 254:1183\nTumanskii B, Kalina O (2001) Radical reactions of fullerenes and their derivatives. Kluwer Academic, Dordrecht\nGeckeler KE, Samal S (2001) Fuller Nanotub Carbon Nanostruct 9:17\nArsalani N, Geckeler KE (1996) Fuller Sci Technol 4:897\nCataldo F (2000) Fuller Sci Technol 8:153\nCataldo F (2001) Fuller Sci Technol 9:497\nCataldo F (2001) Fuller Sci Technol 9:515\nTroitskii BB, Troitskaya LS, Dmitriev AA, Yakhnov AS (2000) Eur Polym J 36:1073\nAllen N, Zeynalov EB, Taylor K, Birkett P (2009) Polym Degrad Stab 94:1932\nZeynalov EB, Allen NS, Salmanova NI (2009) Polym Degrad Stab 94:1183\nCataldo F (ed) (2008) Medicinal chemistry and pharmacological potential of fullerenes and carbon nanotubes. Springer, Berlin\nCataldo F (2010) Chem Phys Lipids 163:524\nCataldo F (2010) Fullerenes solubility in fats and their potential application as antineoplastic agents. In: Graovac A (ed) The 25th international course and conference on the interfaces among mathematics, chemistry and computer sciences, Dubrovnik, 7–12 June 2010\nCataldo F, Pentimalli M, Ragni P (2000) Fuller Sci Technol 8:623\nCataldo F, Gobbino M, Ragni P (2007) Fuller Nanotub Carbon Nanostruct 15:379\nTakada H, Mimura H, Xiao L, Islam RM, Matsubayashi K, Ito S, Miwa N (2006) Fuller Nanotub Carbon Nanostruct 14:335\nKaushik P, Kaushik G (2007) J Hazard Mater 143:102\nLong K, Boyce M, Lin H, Yuan J, Ma D (2005) Bioorg Med Chem Lett 15:3849\nMcCarty GW (1999) Biol Fertil Soils 29:1\nGao X, Ishimura K, Nagase S, Chen Z (2009) J Phys Chem A 113:3673\nCataldo F (ed) (2006) Polyynes: synthesis, properties and applications. CRC Press, Boca Raton\nCataldo F (2005) Fuller Nanotub Carbon Nanostruct 13:239\nCataldo F (2005) Fuller Nanotub Carbon Nanostruct 13:31\nMason TJ, Lorimer JP (1988) Sonochemistry: theory, applications and uses of ultrasound in chemistry. Ellis Horwood, Chichester\nFoglein KA, Szabò PT, Dombi AD, Szepvolgyi J (2003) Plasma Chem Plasma Process 23:651\nColthup NB, Daly LH, Wiberley SE (1990) Introduction to infrared and Raman spectroscopy, 3rd edn. Academic Press, San Diego\nTaylor R (1999). Lecture notes on fullerene chemistry. A handbook for chemists, Chap 7. Imperial College Press, London\nAlippi A, Cataldo F, Galbato N (1992) Ultrasonics 30:148\nFrancony A, Petrier C (1996) Ultrason Sonochem 3:S77\nMason SF (1961) Q Rev Chem Soc 15:287",{"VOID":1431},"10.1007\u002Fs11090-012-9417-5","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002Fs11090-012-9417-5",[1434,1458,1473],{"id":1435,"sortIndex":32,"researcher":28,"roles":1436,"affiliations":1437,"properties":1455},"8bfb7796-87e0-4997-9d55-400ecaede0ba",[1035],[1438,1446],{"id":1439,"sortIndex":32,"affiliation":1440,"properties":28},"4fe87c43-edb6-41ff-a330-1332bdcb1594",{"id":1439,"createTime":28,"updateTime":28,"relativeEntities":1441,"slug":28,"properties":1442,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1445,"statistic":28},[],{"title":1443},{"VI":1444},"Department of Chemistry, Università di Tor Vergata, Rome, Italy",[],{"id":1447,"sortIndex":40,"affiliation":1448,"properties":1454},"a55f3791-28f8-414f-877e-f5da0a69cdfb",{"id":1447,"createTime":28,"updateTime":28,"relativeEntities":1449,"slug":28,"properties":1450,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1453,"statistic":28},[],{"title":1451},{"VI":1452},"Lupi Chemical Research srl, Rome, Italy",[],{},{"title":1456},{"VI":1457},"Franco 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discharges",{"abstract":1555,"title":1557,"references":1559,"doi":1561},{"EN":1556},"Pulsed positive corona discharges are used to remove NO from the flue gas of a methane burner. At low power input this leads to an increase in NO2, which shows that the process is oxidative. Removal efficiency is greatest when discharges are produced with high-voltage pulses, which are shorter in duration than the time required by the primary streamers to cross the discharge gap, in combination with a dc bias. Other important parameters are input power density and residence time. The best result obtained so far is an energy consumption of 20 eV per NO molecule removed, at 50% deNOx i.e., a removal of 150 ppm NOx, using a residence time of 15 s and an input power density, of 3.5 Wh\u002FNm3. [Wh\u002FNm3 stands for watt-hour per normal cubic meter, i.e., at normal conditions (273 K and 1 bar). This implies that 1 Nm3 contains 2.505 1025 molecules.] There appears to be room for improvement by the addition of gaseous and particulate chemicals or the use of multiple corona treatment. It is argued front comparison between results from models and experiments that the direct production of OH by the discharge is only the initiation of the cleaning process.",{"EN":1558},"Energy efficiency of NO removal by pulsed corona discharges",{"VOID":1560},"H. Mätzing, “Chemical kinetics of flue gas cleaning by irradiation with electrons,” inAdvances in Chemical Physics, Vol. LXXX, ed. I. Prigogine, Wiley, New York (1991) pp. 315–359.\nY. L. M. Creyghton, “Pulsed positive corona discharges: fundamental study and application to flue gas treatment, Dissertation, Eindhoven University of Technology, September 1994.\nN. W. Frank,Radiat. Phys. Chem. 40, 267–272 (1992).\nD. Braun, U. Kuchler, and G. Pietsch,J. Phys. D: Appl. Phys. 24, 564–572 (1991).\nK. J. McLean,IEE Proc. 135, 347–361 (1988).\nS. Masuda, M. Hirano, and K. Akutsu,Radiat. Phys. Chem. 17, 223–228 (1981).\nS. Masuda,Pure Appl. Chem. 60, 727–731 (1988).\nN. Frank and S. Hirano, “The history of electron beam processing for environmental pollution control and work performed in the United States,” inNon-Thermal Plasma Techniques for Pollution Control, NATO Advanced Series Institute Series G,3413, eds. B. M. Penetrante and S. E. Schultheis, Springer, Heidelberg (1993), pp. 1–26.\nL. Civitano and E. Sani “DeNOx-deSOx process by gas energization,” inPlasma Technology: Fundamentals and Applications, ed. M. Capitelli, Plenum, New York (1992), pp. 153–166.\nR. H. Amirov, E. I. Asinovsky, L. I. Kropp, I. S. Samoilov., and A. M. Zykov, “Effect of fly ash removal of sulfur dioxide from flue gas utilizing nanosecond corona discharges,” in 10th Symposium on Elementary Processes and Chemical Reactions in Low-Temperature Plasma, ed. M. Morvova and P. Lukac, Comenius University, Bratislava (1994).\nS. Masuda, “Report on novel dry DeNO x \u002FDeSO x technology for cleaning combustion gases from utility thermal power plant boilers,” inNon-Thermal Plasma Techniques for Pollution Control, NATO Advanced Series Institute Series G,34B, eds. B. M. Penetrante and S. E. Schultheis, Springer, Heidelberg (1993), pp. 131–137.\nE. M. van Veldhuizen, Y. L. M. Creyghton, and W. R. Rutgers, “Conversion of NO and SO2 by pulsed corona discharge,” in Book of Invitee Lectures of 10th Symposium on Elementary Processes and Chemical Reactions in Low-Temperature Plasma, eds. M. Morvova and P. Lukac, Comenius University, Bratislava (1994).\nJ. S. Clements, A. Mizuno, W. C. Finney, and R. H. Davis,IEEE Trans. Ind. Appl. 25, 62–69 (1989).\nK. Yan, R. Li, M. Cui, L. Zhou, and H. Zhao, “Removal of NO x and SO2 by bipolar corona,” Proc. 4th Int. Conf. on Electrostat. Precip ed. Ruinian Li, Int. Ac. Publ Beijing (1991), pp. 635–649.\nS. Masuda, Y. Wu, T. Urabe, Y. Ono, “Pulse corona induced plasma chemical process for DeNO x , DeSO x , and mercury vapour control of combustion gas,” Proc. 3rd Int. Conf. on Electrostat. Precip., ed. M. Rea, Abano-Padova, Italy, Masera di Padova: Tipolito (1987), pp. 667–676.\nR. H. Amirov, E. I. Asinovski, I. S. Samoilov, and A. V. Shepelin,Plasma Sources Sci. Technol. 2, 289–295 (1993).\nK. Fuji, “Simultaneous removal of NO x SO x and soot in diesel engine exhaust by plasma\u002Foil dynamic means,” inPlasma Technology: Fundamentals and Applications, ed. M. Capitelli, Plenum, New York (1992), pp. 143–152.\nB. M. Penetrante, G. E. Vogtlin, J. N. Bardsley, P. A. Vitello, and P. H. Wallman, “Application of non-thermal plasmas for pollution control,” Proc. 2nd Int. Plasma Symp. World Progress in Plasma Appl., Palo Alto, California, 1993, pp. 1–11.\nN. Yu. Babaeva, A. A. Kulikovskiy, A. Kh. Mnatsakanian, G. V. Naidis, and Yu. M. Solozobov,Flue Gas Cleaning by Pulse Corona, Part I: The Streamer Propagation Models in N 2-O2 Mixtures and Flue Gas, IVTAN Analytical & Numerical Research Association, Moscow, Research Report IVTAN-ANRA #93\u002F2, 1993, pp. 1–48.\nG. Yu. Alekseev, A. V. Levchenko, and V. A. Bityurin,Flue Gas Cleaning by Pulse Corona, Part II: The Chemical Kinetics and Heat- and Mass Transfer in NO\u002FSO 2 Removal, IVTAN Analytical & Numerical Research Association, Moscow, Research Report IVTAN-ANRA #93\u002F2, 1993.\nY. L. M. Creyghton, W. R. Ruigers, and E. M. van Veldhuizen, “In-situ investigation of pulsed corona discharge,” Eindhoven University of Technology, EUT Report 93-E-279, 1993.\nY. L. M. Creyghton, E. M. van Veldhuizen and W. R. Rutgers,IEE Proc.-Sci. Meas. Technol. 141, 141–147 (1994).\nM. Yousfi, A. Himoudi, and A. Gaouar,Phys. Rev. A 46, 7889–7901 (1992).\nJ.-M. Guo and C.-H.J. Wu,IEEE Trans. Plasma Sci. 21, 684–695 (1993).\nG. A. Dawson and W. P. Winn,Z. 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Phys. 27, I: 2556–2563, II: 2564–2569 (1994).",{"VOID":1562},"10.1007\u002FBF01570180","http:\u002F\u002Flink.springer.com\u002F10.1007\u002FBF01570180",[1565,1580,1593],{"id":1566,"sortIndex":32,"researcher":28,"roles":1567,"affiliations":1568,"properties":1577},"21074a1f-0d86-4fd5-8959-f539011a784e",[1035],[1569],{"id":1570,"sortIndex":32,"affiliation":1571,"properties":28},"d3a37fc1-2df1-461e-b3cb-894fe3a7787d",{"id":1570,"createTime":28,"updateTime":28,"relativeEntities":1572,"slug":28,"properties":1573,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1576,"statistic":28},[],{"title":1574},{"VI":1575},"Project Coal and Electricity, Division of Electrical Energy Systems, Faculty of Electrical Engineering, Eindhoven University of Technology, The Netherlands",[],{"title":1578},{"VI":1579},"E. 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Rutgers",{"id":1594,"sortIndex":123,"researcher":28,"roles":1595,"affiliations":1596,"properties":1605},"deb8af2e-b472-4e40-a8e8-de66e03077a4",[1035],[1597],{"id":1598,"sortIndex":32,"affiliation":1599,"properties":28},"88ef023e-4a12-4394-9718-2aaa2b72811c",{"id":1598,"createTime":28,"updateTime":28,"relativeEntities":1600,"slug":28,"properties":1601,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1604,"statistic":28},[],{"title":1602},{"VI":1603},"IVTAN Analytical and Numerical Research Association, Izhorskaya, Moscow, Russia",[],{"title":1606},{"VI":1607},"V. A. Bityurin",{"url":1563,"publisher":1609,"properties":1662},{"id":868,"createTime":869,"updateTime":870,"relativeEntities":1610,"slug":872,"properties":1611,"entityType":25,"verifyStatus":882,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":32,"subjectFields":1615,"manageAffiliations":1631,"indexDatabases":1642,"url":28,"thumbnailPath":28,"statistic":1657,"gsStatistic":28,"type":55,"analyzePriority":28},[],{"issn":1612,"title":1613,"eissn":1614},{"VOID":877},{"EN":879},{"VOID":875},[1616,1620,1624,1628],{"id":885,"createTime":28,"updateTime":28,"relativeEntities":1617,"label":1618,"description":1619,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":888},{},{"id":891,"createTime":28,"updateTime":28,"relativeEntities":1621,"label":1622,"description":1623,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":894},{},{"id":897,"createTime":28,"updateTime":28,"relativeEntities":1625,"label":1626,"description":1627,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":900},{},{"id":903,"createTime":28,"updateTime":28,"relativeEntities":1629,"label":1630,"description":28,"parentId":28,"standard":28,"scholarHubFieldId":28},[],{"EN":906},[1632,1637],{"id":909,"createTime":28,"updateTime":28,"relativeEntities":1633,"slug":28,"properties":1634,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1636,"statistic":28},[],{"title":1635},{"EN":913},[],{"id":916,"createTime":28,"updateTime":28,"relativeEntities":1638,"slug":28,"properties":1639,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1641,"statistic":28},[],{"title":1640},{"EN":920},[922],[1643,1650],{"id":925,"indexDatabase":1644,"url":931,"indexYears":932,"academicFieldIds":1649,"indexDatabaseRanking":938},{"id":775,"createTime":28,"updateTime":28,"relativeEntities":1645,"label":1646,"description":1647,"key":781,"publicationTags":1648,"standard":28},[],{"EN":778,"VI":778},{"EN":778,"VI":780},[783],[934,935,936,937],{"id":940,"indexDatabase":1651,"url":952,"indexYears":28,"academicFieldIds":1656,"indexDatabaseRanking":28},{"id":942,"createTime":28,"updateTime":28,"relativeEntities":1652,"label":1653,"description":1654,"key":949,"publicationTags":1655,"standard":28},[],{"EN":945,"VI":945},{"EN":947,"VI":948},[951,813],[954,955],{"impactFactor":32,"impactFactorByYear":1658,"i10Index":961,"i10IndexLast5Year":127,"totalPublication":962,"totalPublicationByYear":1659,"totalCitation":965,"totalCitationByYear":1660,"totalCitationPerPublication":979,"totalCitationPerPublicationByYear":1661,"hindexLast5Year":201,"hindex":201},{"2012":194,"2013":422,"2014":223,"2015":347,"2016":958,"2017":840,"2018":462,"2019":115,"2020":119,"2021":440,"2022":959,"2023":960},{"1981":130,"1982":51,"1983":129,"1984":51,"1985":128,"1986":134,"1987":122,"1988":135,"1989":138,"1990":140,"1991":135,"1992":131,"1993":122,"1994":146,"1995":138,"1996":133,"1997":199,"1998":128,"1999":134,"2000":129,"2001":199,"2002":134,"2003":140,"2004":127,"2005":132,"2006":148,"2007":142,"2008":147,"2009":132,"2010":279,"2011":280,"2012":567,"2013":162,"2014":158,"2015":688,"2016":688,"2017":428,"2018":280,"2019":516,"2020":516,"2021":50,"2022":436,"2023":964,"2024":135},{"1981":160,"1982":967,"1983":602,"1984":278,"1985":613,"1986":149,"1987":334,"1988":162,"1989":968,"1990":161,"1991":152,"1992":69,"1993":613,"1994":330,"1995":969,"1996":280,"1997":280,"2004":574,"2005":970,"2006":971,"2007":281,"2008":360,"2009":206,"2010":972,"2011":280,"2012":973,"2013":616,"2014":276,"2015":974,"2016":578,"2017":975,"2018":976,"2019":977,"2020":602,"2021":978,"2022":688,"2023":127,"2024":123},{"1981":593,"1982":981,"1983":982,"1984":464,"1985":983,"1986":984,"1987":985,"1988":986,"1989":987,"1990":988,"1991":838,"1992":989,"1993":990,"1994":991,"1995":992,"1996":993,"1997":994,"2004":995,"2005":996,"2006":997,"2007":998,"2008":999,"2009":235,"2010":1000,"2011":40,"2012":1001,"2013":1002,"2014":1003,"2015":1004,"2016":1005,"2017":1006,"2018":1007,"2019":1008,"2020":1009,"2021":1010,"2022":1011,"2023":194,"2024":108},{"pages":1663,"volume":1665},{"VOID":1664},"227-247",{"VOID":1666},"16","1996-06-01",1996,[951,938],{"id":1671,"createTime":1672,"updateTime":1673,"relativeEntities":1674,"slug":1675,"properties":1676,"entityType":1029,"verifyStatus":26,"verifyTime":1673,"verifyNote":1182,"languages":28,"translateLanguages":28,"viewCount":32,"primaryUrl":1685,"fullTextUrl":28,"authors":1686,"publicationType":1102,"publisherRelationship":1741,"citationCount":28,"citationInfo":28,"publishDate":1800,"publishYear":1801,"citationAnalyzeStatus":882,"lastCitationAnalyze":28,"indexDatabases":1802,"openAccess":28,"references":28,"isForceReanalyzing":1165},"00ed0a79-265b-494c-a99b-525872c293ec","2024-01-09T08:52:00.616+00:00","2025-02-07T17:10:52.489+00:00",[],"Optical-emission-spectroscopy-and-actinometry-in-CCl4-Cl2-radiofrequency-discharges",{"abstract":1677,"title":1679,"references":1681,"doi":1683},{"EN":1678},"Radiofrequency discharges fed with CCl4-Cl2 mixtures have been studied in the pressure range 0.3 to 0.6 torr by means of emission spectroscopic actinometry with Ar, He, and N2 as actinometers. Two different reactors, a parallel plate and a capacitively coupled tubular one, have been utilized for this study to obtain information for a large range of electron energy distributions. Analysis of the experimental results demonstrates the following: the utilization of actinometry and its range of validity, the importance of electron attachment to CClx species during the plasma decomposition process, and the effects of the presence of chlorine and “glowpolymer” in the discharge medium.",{"EN":1680},"Optical emission spectroscopy and actinometry in CCl4-Cl2 radiofrequency discharges",{"VOID":1682},"R. A. Gottscho, G. P. Davis, and R. H. Burton,Plasma Chem. Plasma Process. 3, 193 (1983).\nR. A. Gottscho, G. Smolinsky, and R. H. Burton,J. Appl. Phys. 53, 5908 (1982).\nH. J. Tiller, D. Berg, and R. Mohr,Plasma Chem. Plasma Process. 1, 233 (1981).\nV. V. Gusev, V. M. Dolgopov, D. I. Slovetskii, and E. F. Shelykhmanov,High Temp. 21, 15 (1983).\nD. L. Flamm and V. M. Donnelly,Plasma Chem. Plasma Process. 1, (1981), and references therein.\nJ. W. Coburn,Plasma Chem. Plasma Process. 2, 1 (1982), and references therein.\nH. J. Tiller, R. Göbel, F. W. Breitbarth, and D. Sameith,Proceedings of the 6th International IUPAC Symposium on Plasma Chemistry, M. J. Boulos and R. J. Munz, eds., Vol. 3, p. 577, Montreal, 1983.\nG. Smolinsky, R. P. Chang, and T. M. Mayer,J. Vac. Sci. Technol. 18, (1981); Y. Horiike, T. Yamazaki, M. Shibagaki, and T. Kurisaki,Jpn. J. Appl. Phys. 21, 1412 (1982); R. H. Bruce inPlasma Processing, R. G. Frieser and C. J. Mogab, eds., The Electrochemical Soc., Pennington (1981), p. 243; P. M. Schaible, W. C. Metzger, and J. P. Anderson,J. Vac. Sci. Technol. 15, 334 (1978); B. J. Curtis and H. J. Brunner,J. Electrochem. Soc. 125, 829 (1978); B. J. Curtis,Solid State Technol. 24, 129 (1980); G. C. Schwartz and P. M. Schaible,Solid State Technol. 23, 85 (1980).\nJ. W. Coburn and M. Chen,J. Appl. Phys. 51, 3134 (1980); J. W. Coburn and M. Chen,J. Vac. Sci. Technol. 18, 353 (1981).\nR. d'Agostino, F. Cramarossa, S. De Benedicits, and G. Ferraro,J. Appl. Phys. 52, 1259 (1981); R. d'Agostino, V. Colaprico, and F. Cramarossa,Plasma Chem. Plasma Process.1, 365 (1981).\nR. d'Agostino, F. Cramarossa, and S. De Benedictis,Plasma Chem. Plasma Process. 2, 213 (1982); R. d'Agostino, F. Cramarossa, V. Colaprico, and R. d'Ettole,J. Appl. Phys. 54, 1284 (1983).\nD. L. Flamm, P. L. Cowan, and G. A. Golovchenko,J. Vac. Sci. Technol. 17, 1341 (1980).\nH. U. Scheunemann, E. Illenberger, and H. Baumgärtel,Ber. Bunsenges. Phys. Chem. 84, 580 (1980); J. P. Johnson, L. G. Christophorou, and J. G. Carter,J. Chem. Phys. 67, 2196 (1977); H. S. W. Massey, E. H. S. Burhop, and H. B. Gilbody,Electronic and Ionic Impact Phenomena, Vol. 2, Oxford University Press (1969).",{"VOID":1684},"10.1007\u002FBF00566839","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002FBF00566839",[1687,1702,1715,1728],{"id":1688,"sortIndex":32,"researcher":28,"roles":1689,"affiliations":1690,"properties":1699},"c086e4d5-15b6-43d6-ad8e-930736515f03",[1035],[1691],{"id":1692,"sortIndex":32,"affiliation":1693,"properties":28},"2ab32a0f-2004-4450-a830-69e892fec724",{"id":1692,"createTime":28,"updateTime":28,"relativeEntities":1694,"slug":28,"properties":1695,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1698,"statistic":28},[],{"title":1696},{"VI":1697},"Centro di Studio per la Chimica dei Plasmi, C. N. R., Dipartimento di Chimica, Università di Bari, Bari, Italy",[],{"title":1700},{"VI":1701},"Riccardo d'Agostino",{"id":1703,"sortIndex":40,"researcher":28,"roles":1704,"affiliations":1705,"properties":1712},"107bece1-8369-4bdb-9b48-c80e8f0c3784",[1035],[1706],{"id":1692,"sortIndex":32,"affiliation":1707,"properties":28},{"id":1692,"createTime":28,"updateTime":28,"relativeEntities":1708,"slug":28,"properties":1709,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1711,"statistic":28},[],{"title":1710},{"VI":1697},[],{"title":1713},{"VI":1714},"Francesco 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Microstructure-and-on-Metal-Transfer-Mode-in-GMAW-Noteworthy-Role-of-Alkali-Elements",{"abstract":1810,"title":1812,"references":1814,"doi":1816},{"EN":1811},"Metal Active Gas (MAG) welding in presence of Argon and CO2 mixture as shielding gas is a largely developed process allowing the transfer of the liquid metal from the consumable wire anode to the workpiece according to various modes (short-arc, globular, spray-arc). The CO2 presence in the shielding gas leads to the formation of an oxide layer, or gangue, wrapping the droplet, limiting the access to the spray-mode transfer, taking into account the low conductivity and the high viscosity of this layer. Several electrodes of various compositions have been tested thanks to Flux Cored Arc Welding, to limit the gangue formation or its negative contribution, based on Ti, La, Zr and alkali metals addition or reduction in silicon content. The results are interpreted considering the metal transfer mode for a given current intensity (330 and 410 A), with various CO2 concentrations in the shielding gas. Finally, the role of the gangue, compared to the other factors governing the droplet detachment, is discussed. A decrease in silicon content limits significantly the gangue formation and gives access to spray arc transfer up to 30 vol.% of CO2 at 330 A. Titanium addition leads to the same results. The tests in presence of zirconium proved the conductivity improvement of the gangue. The addition of alkali allows to stabilize the spray arc up to the noteworthy value of 60 vol.% of CO2 at 330 A, supporting the hypothesis of a strong influence of viscosity on droplets detachment in the process.",{"EN":1813},"Influence of Wire Initial Composition on Anode Microstructure and on Metal Transfer Mode in GMAW: Noteworthy Role of Alkali Elements",{"VOID":1815},"Bacon JF, Hasapis AA (1959) Viscosity of molten silica. J Appl Phys 30:1470–1471\nBockris JO’M, Mackenzie JD, Kitchener JA (1955) Viscous flow in silica and binary liquid silicates. Trans Faraday Soc 51:1734–1748\nGaur K, Verma SC, Lal HB (1987) Defects and electrical conduction in mixed lanthanum transition metal oxides. Journal of Materials Science. 23:1725–1728\nHaidar J (1998) An analysis of the formation of metal droplets in arc welding. J Phys D Appl Phys 31:1233–1244\nHalden FA, Kingery WD (1955) effect of C, N, O and S on liquid iron surface tension and interfacial energy with Al2O3. J Phys Chem 59(6):557–559\nHandbook (1972) Handbook on property of liquid iron and slag, 1972. Iron and Steel Institute of Japan, Tokyo\nHu J, Tsai HL (2006) Heat and mass transfer in gas metal arc welding. Part II. The metal. Int J Heat Mass Transf 50:808–820\nIordachescu D, Quintino L (2008) Steps towards a new classification of metal transfer in gas metal arc welding. J Mat Proces Tech 202(1–3):391–397\nJones LA, Eagar TW, Hang JH (1998) A dynamic model of drops detaching for gas metal arc welding electrodes. J Phys D Appl Phys 31:107–123\nJones LA, Eagar TW, Hang JH (1998) Magnetic forces acting in molten drops on gas metal arc welding. J Phys D Appl Phys 31:93–106\nKhalil M (2003) Influence of iron content on the electrical and dielectric properties of La0.7Ba0.3Co1-yFeyO3. Zeitschrift für Physicalische Chemie. 217:1387–1398\nKidd T, Gaskel DR (1986) Measurement of the surface tension of Fe-saturated iron silicates ant Fe-saturated calcium-ferrite meltes by Padday’s cone technique. Metall Trans B 17B:771–776\nKozakevitch P (1949) Surface tension and viscosity of synthetic slags. Rev. Métallurg. 46(8):505–516\nLancaster JF (1984) The physics of welding. Pergamon Press, Oxford, pp 204–234\nLe Losq C, Neuville DR (2013) Effect of the Na\u002FK mixing on the structure and the rheology of tectosilicate silica-rich melts. Chem Geol 346:57–71\nLeonidov IA, Kozhevnikov VL, Patrakeev MV, Mitberg EB, Poeppelmeier KR (2001) High-temperature electrical conductivity of Sr0.7La0.3FeO3-δ. Solide Stats Ionics. 144:361–369\nMysen B, Richet P (2005) Silicate glasses and melts—properties and structure. Chap 10: Iron-bearing melts, 1st edn. Elsevier Science, Amsterdam\nNemchinsky VA (1996) The effect of the type of plasma gas on current constriction at the molten tip of an arc electrode. J Phys D Appl Phys 29:1202\nNishioka K, Maeda T, Shimizu M (2005) Effect of FeO in dripping slag on drainage ability of slag. ISIJ Int 45(10):1506–1514\nOhmori A, Park KC, Inuzuka M, Arata Y, Inoue K, Iwamoto N (1991) Electrical conductivity of plasma-sprayed titanium oxide (rutile) coatings. Thin Solid Films 201(1):1–8\nSchenk H, Frohberg MG, Rohde W (1961) Arch. Eisenmhüttenwes 32:521–523\nScotti A (2000) Mapping transfer modes for stainless steel gas metal are welding. Sci Technol Weld Joining 5:227–234\nShlyakhtina AV, Shcherbakova LG (2011) Polymorphism and high-temperature conductivity of Ln2M2O7 (Ln = Sm-Lu; M = Ti, Zr, Hf) pyrochlores. Solid State Ionics 192:200–204\nSrivastava JK, Prasad M, Wagner JB Jr (1985) Electrical conductivity of silicon dioxide thermally grown on silicon. J Electrochem Soc 132(4):955–963\nSumita S, Morinaga KJ, Yanagase T (1983) Physical properties and structure of binary ferrite melts. Trans Jpn Inst. Metals 24:35–41\nTannhauser DS (1962) Conductivity of iron oxides. J Phys Chem Solids 23:25–34\nValensi F, Pellerin S, de Izarra Ch, Pellerin N, Dzierzega K, Musioł K, Briand F (2008) Experimental investigations on anode in GMAW. In 8th Conference on trends in welding resarch, pp 417–424\nValensi F, Pellerin S, Castillon Q, Boutaghane A, Dzierzega K, Zielinska S, Pellerin N, Briand F (2013) Study of the spray to globular transition in gas metal arc welding: a spectroscopic investigation. J Phys D Appl Phys 46:224005\nWang W, Liu S, Jones JE (1995) Flux cored arc welding: arc signals, processing and metal transfer characterizatio. Welding J pp 369 s–377 s\nWang Y, Tsai HL (2000) Impingement of filler droplets and weld pool dynamics during gas metal arc welding process. Int J Heat Mass Transf 44:2067–2080\nYamamoto O, Arati Y, Takeda Y, Imanishi N, Mizutani Y, Kawai M, Nakamura Y (1995) Electrical conductivity of stabilized zirconia with ytterbia and Scandia. Solid State Ionics 79:137–142\nZielinska S, Musioł K, Dzierzega K, Pellerin S, Valensi F, de Izarra Ch, Briand F (2007) Investigations of GMAW plasma by optical emission spectroscopy. Plasma Sources Sci Technol 16:832–838\nZielinska S, Valensi F, Pellerin N, Pellerin S, Musiol K (2009) Microstructural analysis of the anode in gas metal arc welding. J Mat Process Tech 209:3581–3591\nZhang S, Zhang X, Liu W, Lv X, Bai C, Wang L (2014) Relationship between structure and viscosity of CaO–SiO2–Al2O3–MgO–TiO2 slag. J Non-Cryst Solids 402:214–222",{"VOID":1817},"10.1007\u002Fs11090-017-9860-4","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002Fs11090-017-9860-4",[1820,1835,1850,1865,1878,1893,1908],{"id":1821,"sortIndex":32,"researcher":28,"roles":1822,"affiliations":1823,"properties":1832},"33e53fd8-d2e2-4d79-a207-7d0c01e23d61",[1035],[1824],{"id":1825,"sortIndex":32,"affiliation":1826,"properties":28},"8d20f058-b59b-426d-a16e-89e8f9d2eb2d",{"id":1825,"createTime":28,"updateTime":28,"relativeEntities":1827,"slug":28,"properties":1828,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":1831,"statistic":28},[],{"title":1829},{"VI":1830},"LAPLACE (Laboratoire Plasma et Conversion d’Energie), Université de Toulouse, UPS, INPT, Toulouse Cedex 9, France",[],{"title":1833},{"VI":1834},"F. 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quantitative interpretation of the schlieren technique applied to a non-thermal atmospheric-pressure oxygen plasma jet driven at low-frequency (50 Hz) is reported. The jet was operated in the turbulent regime with a hole-diameter based Reynolds number of 13,800. The technique coupled to a simplified kinetic model of the jet effluent region allowed deriving the temporally-averaged values of the gas temperature of the jet by processing the gray-level contrast values of digital schlieren images. The penetration of the ambient air into the jet due to turbulent diffusion was taken into account. The calibration of the optical system was obtained by fitting the sensitivity parameter so that the oxygen fraction at the nozzle exit was unity. The radial profiles of the contrast in the discharge off case were quite symmetric on the whole outflow, but with the discharge on, relatively strong departures from the symmetry were evident in the near field. The time-averaged gas temperature of the jet was relatively high, with a maximum departure of about 55 K from the room temperature; as can be expected owing to the operating molecular gas. The uncertainty in the temperature measurements was within 6 K, primarily derived from errors associated to the Abel inversion procedure. The results showed an increase in the gas temperature of about 8 K close to the nozzle exit; thus suggesting that some fast-gas heating (with a heating rate ~0.3 K\u002Fμs) still occurs in the near field of the outflow.",{"EN":1992},"Ambient Species Density and Gas Temperature Radial Profiles Derived from a Schlieren Technique in a Low-Frequency Non-thermal Oxygen Plasma Jet",{"VOID":1994},"Lua X, Naidis GV, Laroussi M, Reuter S, Graves DV, Ostrikov K (2016) Phys Rep 630:1–84\nGraves DB (2014) Phys Plasmas 21:080901\nStaack D, Farouk B, Gutsol A, Fridman A (2007) Plasma Sources Sci Technol 17:025013\nKunhardt EE (2000) IEEE Trans Plasma Sci 28:189–200\nFridman A, Chirokov A, Gutsol A (2005) J Phys D Appl Phys 38:R1–R24\nPark GY, Park SJ, Choi MY, Koo IG, Byun JH, Hong JW, Sim JY, Collins GJ, Lee JK (2012) Plasma Sources Sci Technol 21:043001\nLaroussi M, Kong MG, Morfill G, Stolz W (2012) Plasma medicine, vol 1. Cambridge University Press, Cambridge\nWalsh JL, Kong MG (2011) Appl Phys Lett 99:081501\nPei X, Lu X, Liu J, Liu D, Yang Y, Ostrikov K, Chu PK, Pan Y (2012) J Phys D Appl Phys 45:165205\nYan W, Han ZJ, Liu WZ, Lu XP, Phung BT, Ostrikov K (2013) Plasma Chem Plasma Process 33:479–490\nMinotti F, Giuliani L, Xaubet M, Grondona D (2015) Phys Plasmas 22:113512\nOvsyannikov AA, Zhukov MF (2005) Plasma diagnostics. Cambridge International Science Publishing, Cambridge\nSettles GS (2001) Schlieren and shadowgraph techniques. Springer, Berlin\nVasilev LA (1971) Schlieren methods. Keter Inc., New York\nJiang N, Yang J, He F, Cao Z (2011) J Appl Phys 109:093305\nOh JS, Olabanji OT, Hale C, Mariani R, Kontis K, Bradley JW (2011) J Phys D Appl Phys 44:155206\nBradley JW, Oh JS, Olabanji OT, Hale C, Mariani R, Kontis K (2011) IEEE Trans Plasma Sci 39:2312–2313\nGhasemi M, Olszewski P, Bradley JW, Walsh JL (2013) J Phys D Appl Phys 46:052001\nRobert E, Sarron V, Darny T, Ries D, Dozias S, Fontane J, Joly L, Pouvesle JM (2014) Plasma Sources Sci Technol 23:012003\nBoselli M, Colombo V, Ghedini E, Gherardi M, Laurita R, Liguori A, Sanibondi P, Stancampiano A (2014) Plasma Chem Plasma Proc 34:853–869\nKelly S, Golda J, Turner MM, Schulz-von der Gathen V (2015) J Phys D Appl Phys 48:444002\nZheng Y, Wang L, Ning W, Jia S (2016) J Appl Phys 119:123301\nQaisrani MH, Xian Y, Li C, Pei X, Ghasemi M, Lu X (2016) Phys Plasmas 23:063523\nXu DA, Shneider MN, Lacoste DA, Laux CO (2014) J Phys D Appl Phys 47:235202\nAlvarez-Herrera C, Moreno-Hernández D, Barrientos-García B (2008) J Opt A: Pure Appl Opt 10:104014\nKogelschatz U, Schneider WR (1972) Appl Opt 11:1822–1832\nPrevosto L, Artana G, Mancinelli B, Kelly H (2010) J Appl Phys 107:023304\nPrevosto L, Artana G, Kelly H, Mancinelli B (2011) J Appl Phys 109:063302\nSchmidt-Bleker A, Reuter S, Weltmann KD (2015) J Phys D Appl Phys 48:175202\nAkishev Y, Grushin M, Karalnik V, Petryakov A, Trushkin N (2010) J Phys D Appl Phys 43:075202\nPrevosto L, Kelly H, Mancinelli B, Chamorro JC, Cejas E (2015) Phys Plasmas 22:023504\nRaizer YuP (1991) Gas discharge physics. Springer, Berlin\nKossyi IA, Kostinsky AYu, Matveyev AA, Silakov VP (1992) Plasma Sources Sci Technol 1:207–220\nYolles RS, Wise H (1968) J Chem Phys 48:5109–5115\nAleksandrov NL, Kindysheva SV, Nudnova MM, Starikovskiy AY (2010) J Phys D Appl Phys 43:255201\nPopov NA (2011) J Phys D Appl Phys 44:285201\nHagelaar GJM, Pitchford LC (2005) Plasma Sources Sci. Technol. 14:722–733. Freeware code BOLSIG + version 07\u002F2015. www.bolsig.laplace.univ-tlse.fr (2015)\nAleksandrov NL, Bazelyan EM, Kochetov IV, Dyatko NA (1997) J Phys D Appl Phys 30:1616–1624\nXiao D, Cheng C, Shen J, Lan Y, Xie H, Shu X, Meng Y, Li J, Chu PK (2014) Phys Plasmas 21:053510\nXiao D, Cheng C, Shen J, Lan Y, Xie H, Shu X, Meng Y, Li J, Chu PK (2014) J Appl Phys 115:033303\nPopov NA (2006) Plasma Phys Rep 32:237–245\nPrevosto L, Kelly H, Mancinelli B (2016) Plasma Chem Plasma Proc 36:973–992\nKnake N, Reuter S, Niemi K, Schulz-von der Gathen V, Winter J (2008) J Phys D Appl Phys 41:194006\nAlpher RA, White DR (1959) Phys Fluids 2:153–161\nNational Institute of Standards and Technology. Engineering metrology toolbox. http:\u002F\u002Femtoolbox.nist.gov\u002FWavelength\u002FCiddor.asp. Last updated Nov 2004\nWeber MJ (2002) Handbook of optical materials. CRC Press, Boca Raton\nUngate CD, Harleman DR, Jirka GH (1975) Stability and mixing of submerged turbulent jets at low Reynolds numbers. MIT Energy Lab Rep\nWeissman S, Mason EA (1962) J Chem Phys 37:1289–1300\nYu L, Laux CO, Packan DM, Kruger CH (2002) J Plasma Phys 91:2678–2686\nBoeuf JP, Kunhardt EE (1986) J Appl Phys 60:915–923\nMintoussov EI, Pendleton SJ, Gerbault FG, Popov NA, Starikovskaia SM (2011) J Phys D Appl Phys 44:285202",{"VOID":1996},"10.1007\u002Fs11090-017-9842-6","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002Fs11090-017-9842-6",[1999,2014,2027,2040,2055,2068],{"id":2000,"sortIndex":32,"researcher":28,"roles":2001,"affiliations":2002,"properties":2011},"c6e462f4-7e76-44bc-b0ba-907c93444aa0",[1035],[2003],{"id":2004,"sortIndex":32,"affiliation":2005,"properties":28},"de4cbd1f-e11a-436e-8b37-07065c8ac70e",{"id":2004,"createTime":28,"updateTime":28,"relativeEntities":2006,"slug":28,"properties":2007,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":2010,"statistic":28},[],{"title":2008},{"VI":2009},"Grupo de Descargas Eléctricas, Departamento Ing. Electromecánica, Facultad Regional Venado Tuerto (UTN), Venado Tuerto, Argentina",[],{"title":2012},{"VI":2013},"J. C. Chamorro",{"id":2015,"sortIndex":40,"researcher":28,"roles":2016,"affiliations":2017,"properties":2024},"1d9d9e83-149e-4fa4-a7a2-429e4df2bda7",[1035],[2018],{"id":2004,"sortIndex":32,"affiliation":2019,"properties":28},{"id":2004,"createTime":28,"updateTime":28,"relativeEntities":2020,"slug":28,"properties":2021,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":2023,"statistic":28},[],{"title":2022},{"VI":2009},[],{"title":2025},{"VI":2026},"L. 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method-in-13-56-MHz-RF-plasmas-of-Ar-CF4-C2F6-and-CHF3",{"abstract":2148,"title":2150,"references":2152,"doi":2154},{"EN":2149},"Electron densit ies have been determined \u002For RF plasmas that were generated within a microwave resonant cavity by measuring the difference of the resonance frequencies with and without plasma. Since that method only yields a value of the electron density weighted ouer the microwave electric field distribution, to obtain real values an assumption on the spatial distribution of the electron density had to he made. Spatial profiles were taken of the emission of a 4s–5p Ar line at 419.8 not (with a small Ar admixture). The electron densities have been determined as a function of pressure and RF power in Ar, CF4, C2 F6 and CHF, plasmas. The results indicate that the electron density for the last three gases decreases as a function of pressure above 50 m Torr. Typical values for the electron density for the investigated parameter range are 1–6 · 103 cm−3. Furthermore, the electron density is the lowest in gases with a high attachment cross .section.",{"EN":2151},"Measurement of electron densities by a microwave cavity method in 13.56-MHz RF plasmas of Ar, CF4, C2F6, and CHF3",{"VOID":2153},"I. Langmuir and H. M. Mott-Smith,Gen. Elec. Rec. 26, 731 (1923).\nL. Lindberg,J. Phys. E 18, 214 (1985).\nJ. Breka and R. Harman,Vacuum 36, 535 (1986).\nN. St. J. Braithwaite and J. E. Allen,J. Phys. D 21, 1733 (1988).\nH. AmemiyaJpn. J. Appl. Phys. 27, 2423 (1988).\nB. Agdur and B. Enander,J. Appl. Phys. 33, 575 (1962).\nC. A. M. de Vries, A.I. van Roosmalen and G. C. C. Puylaert,J. Appl. Phys. 57, 4386 (1985).\nF. J. Mehr and M. A. Biondi,Phys. Rev. 176, 322 (1968).\nJ. L. Jauberteau, G. J. Meeusen, M. Haveriag, G. M. W. Kroesen, and F. J. de Hoog,Appl. Phys. Lett. 55, 2597 (1989).\nT. H. J. Bisschops and F. J. de Hoog, Proc. ISPC-7 (1985), C. J. Timmermans, ed., Eindhoven, The Netherlands, p. 599.\nJ. C. Slater,Rev. Mod. Phys. 18, 441 (1946).\nB. Stefanov, N. Popkirova, and L. Zarkova,J. Phvs. B 21, 3989 (1988).\nK. B. Persson,Phys. Rev. 106, 191 (1957).\nM. Sicha et al.,Br. J. Appl. Phys. 17, 1511 (1966).\nG. Janzen,Z. Naturforsh. 279, 491 (1972).\nM. Haverlag, G. M. W. Kroesen, C. H. J. de Zeeuw, Y. Creyghton, T. H. J. Bisschops, and F. J. de Hoog,J. Vac. Sci. Technol. B 7, 529 (1989).\nT. H. J. Bisschops, Ph.D. Thesis, Eindhoven, 1987.\nS. R. Hunter and L. G. Christophorou,J. Chem. Phys. 80, 6150 (1984).\nM. Haverlag, G. M. W. Kroesen, and F. J. de Hoog, to be published.",{"VOID":2155},"10.1007\u002FBF01458916","https:\u002F\u002Flink.springer.com\u002Farticle\u002F10.1007\u002FBF01458916",[2158,2173,2186,2199],{"id":2159,"sortIndex":32,"researcher":28,"roles":2160,"affiliations":2161,"properties":2170},"34ab2813-e480-4a46-b617-3a5ff366fbb1",[1035],[2162],{"id":2163,"sortIndex":32,"affiliation":2164,"properties":28},"103fe3ac-9a7f-4d40-8392-74edf9717590",{"id":2163,"createTime":28,"updateTime":28,"relativeEntities":2165,"slug":28,"properties":2166,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":2169,"statistic":28},[],{"title":2167},{"VI":2168},"Department of Physics, Eindhoven University of Technology, MB Eindhoven, The Netherlands",[],{"title":2171},{"VI":2172},"M. Haverlag",{"id":2174,"sortIndex":40,"researcher":28,"roles":2175,"affiliations":2176,"properties":2183},"710ef022-8ae1-4095-80fa-ce2326f9c53b",[1035],[2177],{"id":2163,"sortIndex":32,"affiliation":2178,"properties":28},{"id":2163,"createTime":28,"updateTime":28,"relativeEntities":2179,"slug":28,"properties":2180,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":2182,"statistic":28},[],{"title":2181},{"VI":2168},[],{"title":2184},{"VI":2185},"G. M. W. Kroesen",{"id":2187,"sortIndex":123,"researcher":28,"roles":2188,"affiliations":2189,"properties":2196},"faa71ea2-0889-4b0d-8db9-040dbc9a9ca7",[1035],[2190],{"id":2163,"sortIndex":32,"affiliation":2191,"properties":28},{"id":2163,"createTime":28,"updateTime":28,"relativeEntities":2192,"slug":28,"properties":2193,"entityType":28,"verifyStatus":28,"verifyTime":28,"verifyNote":28,"languages":28,"translateLanguages":28,"viewCount":28,"url":28,"parentIds":2195,"statistic":28},[],{"title":2194},{"VI":2168},[],{"title":2197},{"VI":2198},"T. H. J. 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of-Cathodic-Arc-Deposited-Alumina-Thin-Films",{"abstract":2281,"title":2283,"references":2285,"doi":2287},{"EN":2282},"The effect of energy supplied to the growing alumina film on the composition and structure has been investigated by varying substrate temperature and substrate bias potential. The constitution and composition were studied by X-ray diffraction and elastic recoil detection analysis, respectively. Increasing the substrate bias potential from −50 to −100  V caused the amorphous or weakly crystalline films to evolve into stoichiometric, crystalline films with a mixture of the α- and γ-phase above 700 oC, and γ-phase dominated films at temperatures as low as 200 oC. All films had a grain size of \u003C10 nm. The combined constitution and grain size data is consistent with previous work stating that γ-alumina is thermodynamically stable at grain sizes \u003C12 nm [McHale et al., Science 277, 788 (1997)]. In order to correlate phase formation with synthesis conditions, the plasma chemistry and ion energy distributions were measured at synthesis conditions. These results indicate that for a substrate bias potential of −50 V, ion energies in excess of 100 eV are attained, both from a high energy tail and the accelerated ions with charge >1. These results are of importance for an increased understanding of the evolution of film composition and microstructure, also providing a pathway to γ-alumina growth at temperatures as low as 200 o C.",{"EN":2284},"Effect of Ion Energy on Structure and Composition of Cathodic Arc Deposited Alumina Thin Films",{"VOID":2286},"J. M. Schneider W. D. Sproul A. A. Voevodin A. Matthews (1997) J. Vac. Sci. Technol. A 15 1084 Occurrence Handle10.1116\u002F1.580434\nS. Zhu F. Wang H. Lou W. Wu (1995) Surf. Coat Technol. 71 9 Occurrence Handle10.1016\u002F0257-8972(94)02289-3\nE. Serra G. Benamati O. V. Ogorodnikova (1998) J. Nucl. Mater. 255 105 Occurrence Handle10.1016\u002FS0022-3115(98)00038-5\nA. Schütze D.T. Quinto (2003) Surf Coat Technol. 162 174 Occurrence Handle10.1016\u002FS0257-8972(02)00705-3\nC. Täschner B. Ljungberg V. Alfredsson I. Endler A. Leonhardt (1998) Surf Coat Technol 108-109 257 Occurrence Handle10.1016\u002FS0257-8972(98)00561-1\nG. H. Prengel W. Heinrich G. Roder K. H. Wendt (1994) Surf Coat Technol. 68-69 217 Occurrence Handle10.1016\u002F0257-8972(94)90163-5\nEdelstahl Handbuch (Böhler Edelstahl GmbH, Kapfenberg, Germany, 1998)\nO. Zywitzki G. Hoetzsch F. Fietzke K. Goedicke (1996) Surf. Coat Technol. 82 169 Occurrence Handle10.1016\u002F0257-8972(95)00270-7\nO. Zywitzki G. Hoetzsch (1996) Surf Coat Technol. 86-87 640 Occurrence Handle10.1016\u002FS0257-8972(96)02992-1\nY. Yamada-Takamura F. Koch H. Maier H. Bolt (2001) Surf Coat Technol. 142-144 260 Occurrence Handle10.1016\u002FS0257-8972(01)01206-3\nR. Brill F. Koch J. Mazurelle D. Levchuk M. Balden Y. Yamada-Takamura H. Maier H. Bolt (2003) Surf Coat Technol. 174-175 606 Occurrence Handle10.1016\u002FS0257-8972(03)00539-5\nO. Kyrylov D. Kurapov J. M. Schneider (2005) Appl. Phys. A. 80 1657 Occurrence Handle10.1007\u002Fs00339-004-2998-y\nJ.M. Andersson Z. Czigány P. Jin U. Helmersson (2004) J. Vac. Sci. Technol. A. 22 117 Occurrence Handle10.1116\u002F1.1636157\nS. Ruppi A. Larsson (2001) Thin Solid Films 388 50 Occurrence Handle10.1016\u002FS0040-6090(01)00814-8\nA. Larsson S. Ruppi (2001) Int. J. Refract Hard Mater. 19 515 Occurrence Handle10.1016\u002FS0263-4368(01)00016-6\nF. Fietzke K. Goedicke W. Hempel (1996) Surf. Coat Technol. 86 657 Occurrence Handle10.1016\u002FS0257-8972(96)03075-7\nO. Zywitzki G. Hoetzsch (1997) Surf Coat Technol. 94–95 303 Occurrence Handle10.1016\u002FS0257-8972(97)00341-1\nR. Cremer M. Witthaut D. Neuschütz G. Erkens T. Leyendecker M. Feldhege (1999) Surf Coat Technol. 120-121 213 Occurrence Handle10.1016\u002FS0257-8972(99)00458-2\nQ. Li Y.-H. Yu C.S. Bhatia L.D. Marks S.C. Lee Y.W. Chung (2000) J. Vac. Sci. Technol. A. 18 2333 Occurrence Handle10.1116\u002F1.1286715\nU. Kreissig S. Grigull K. Lange P. Nitzsche B. Schmidt (1998) Nucl. Instrum. Meth. B 136 674\nJ.M. Schneider A. Anders B. Hjörvarsson I. Petrov K. Macák U. Helmersson J.-E. Sundgren (1999) Appl. Phys. Lett. 74 200 Occurrence Handle10.1063\u002F1.123292\nJ. M. Schneider K. Larsson J. Lu E. Olsson B. Hjörvarsson (2002) Appl. Phys. Lett. 80 1144 Occurrence Handle10.1063\u002F1.1448389\nS. I. Castañeda I. Montero J. M. Ripalda N. Días L. Galán F. Rueda (1999) J Appl Phys. 85 8415 Occurrence Handle10.1063\u002F1.370690\nJoint Committee on Powder Diffraction Standards (JCPDS).\nJ. M. Schneider A. Anders G. Y. Yushkov (2001) Appl. Phys. Lett. 78 150 Occurrence Handle10.1063\u002F1.1339847\nE. Oks and G. Yushkov, 17th International Symposium on Discharges and Electrical Insulation in Vacuum, Berkeley (1996).\nP. Jin G. Xu M. Tazawa K. Yoshimura D. Music J. Alami U. Helmersson (2002) J. Vac. Sci. Technol. A. 20 2134 Occurrence Handle10.1116\u002F1.1513641\nP. Jin S. Nakao S. X. Wang L. M. Wang (2003) Appl. Phys. Lett. 82 1024 Occurrence Handle10.1063\u002F1.1544442\nD. Kurapov J. M. Schneider (2004) Steel Res. Int. 75 577\nB. A. Movchan A. V. Demchishin (1969) Phys. Met Metallogr. 28 83\nJ. A. Thornton (1974) J. Vac. Sci. Technol. 11 666 Occurrence Handle10.1116\u002F1.1312732\nT. Savisalo D. B. Lewis P. Eh. Hovsepian W.-D. Münz (2004) Thin Solid Films 460 94 Occurrence Handle10.1016\u002Fj.tsf.2003.12.150\nW. D. Callister (2000) Materials Science and Engineering An Introduction EditionNumber5 John Wiley & Sons New York\nB. D. Cullity (1978) Elements of X-Ray Diffraction Addison-Wesley Menlo Park, California\nJ. M. McHale A. Auroux A. J. Perrotta A. 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