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Int., 46, 106, 10.1016\u002Fj.ceramint.2019.08.239\nBie, 2019, In situ grown monolayer N-doped graphene on CdS hollow spheres with seamless contact for photocatalytic CO2 reduction, Adv. Mater., 31, 10.1002\u002Fadma.201902868\nGuo, 2020, Enhanced photoactivity and oxidizing ability simultaneously via internal electric field and valence band position by crystal structure of bismuth oxyiodide, Appl. Catal. B Environ., 262, 118262, 10.1016\u002Fj.apcatb.2019.118262\nKe, 2019, In situ photochemical synthesis noble-metal-free NiS on CdS-diethylenetriamine nanosheets for boosting photocatalytic H2 production activity, Appl. Surf. Sci., 481, 669, 10.1016\u002Fj.apsusc.2019.03.171\nLi, 2020, Noble-metal-free NiS decorated organic-inorganic hybrid ZnxCd1-xSe-diethylenetriamine solid solution for hydrogen evolution, Appl. Surf. 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Rev., 118, 3962, 10.1021\u002Facs.chemrev.8b00400\nLi, 2021, Two-dimensional sulfur- and chlorine-codoped g-C3N4\u002FCdSe-amine heterostructures nanocomposite with effective interfacial charge transfer and mechanism insight, Appl. Catal. B Environ., 280, 10.1016\u002Fj.apcatb.2020.119452\nHe, 2019, Enhanced photocatalytic H2-production activity of WO3\u002FTiO2 step-scheme heterojunction by graphene modification, Chin. J. Catal., 41, 9, 10.1016\u002FS1872-2067(19)63382-6\nXu, 2020, S-scheme heterojunction photocatalyst, Inside Chem., 6, 1543\nWang, 2020, Sb2WO6\u002FBiOBr 2D nanocomposite S-scheme photocatalyst for NO removal, J. Mater. Sci. Technol., 56, 236, 10.1016\u002Fj.jmst.2020.03.039\nXia, 2020, Designing a 0D\u002F2D S-scheme heterojunction over polymeric carbon nitride for visible-light photocatalytic inactivation of bacteria, Angew. Chem. Int. Ed., 59, 5218, 10.1002\u002Fanie.201916012\nRaizada, 2019, Fabrication of Ag3VO4 decorated phosphorus and sulphur co-doped graphitic carbon nitride as a high-dispersed photocatalyst for phenol mineralization and E-coli disinfection, Separ. Purif. Technol., 212, 887, 10.1016\u002Fj.seppur.2018.12.007\nSun, 2019, Molecularly imprinted Ag\u002FAg3VO4\u002Fg-C3N4 Z-scheme photocatalysts for enhanced preferential removal of tetracycline, J. Colloid Interface Sci., 552, 271, 10.1016\u002Fj.jcis.2019.05.060\nMei, 2020, Step-scheme porous g-C3N4\u002FZn0.2Cd0.8S-DETA composites for efficient and stable photocatalytic H2 production, Chin, J. Catal., 41, 41\nZhang, 2018, Ag-Ag3VO4\u002FAgIO3 composites with enhanced visible-light-driven catalytic activity, J. 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Lett., 245, 1, 10.1016\u002Fj.matlet.2019.02.080\nHe, 2019, Direct current field induced asymmetrical DC-resistivity degradation in SrTiO3-based grain boundary layer ceramic, Ceram. Int., 45, 13546, 10.1016\u002Fj.ceramint.2019.03.131\nGong, 2019, WP modified S-scheme Zn0.5Cd0.5S\u002FWO3 for efficient photocatalytic hydrogen production, New J. Chem., 43, 19159, 10.1039\u002FC9NJ04584H\nRen, 2021, S-scheme Sb2WO6\u002Fg-C3N4 photocatalysts with enhanced visible-light-induced photocatalytic NO oxidation performance, Chin, J. 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1968, Controlled growth of monodispersed silica spheres in the micron size range, Journal of Colloid and Interface Science, 26, 62, 10.1016\u002F0021-9797(68)90272-5\nBrinker, 1990\nBell, 1974, Growth mechanism of hydrous chronium (III) oxide spherical particle of narrow size distribution, Journal of Physical Chemistry, 78, 2621, 10.1021\u002Fj100618a018\nBarringer, 1982, Formation, packing and sintering of monodisperse TiO2 powders, Journal of the American Ceramic Society, 65, C, 10.1111\u002Fj.1151-2916.1982.tb09948.x\nOgihara, 1988, Growth mechanism of monodispersed ZrO2 particles, Journal of the American Ceramic Society, 86, 476\nJean, 1986, Processing monosized TiO2 powders generated with HPC dispersant, American Ceramic Society Bulletin, 65, 1574\nOkamura, 1986, Precipitation and sintering of monosized Al2O3-TiO2 composite powder, Journal of the American Ceramic Society, 69, C, 10.1111\u002Fj.1151-2916.1986.tb04726.x\nChange, 1996, Effect of reaction conditions on size and morphology of SiO2 powder in a sol–gel process, Korean Journal of Chemical Engineering, 13, 496, 10.1007\u002FBF02706000\nLaMer, 1950, Theory, prediction and mechanism of formation of monodispersed hydrosols, Journal of the American Chemistry Society, 72, 4847, 10.1021\u002Fja01167a001\nMatsoukas, 1988, Dynamics of growth of silica particles from ammonia-catalyzed hydrolysis of tetra-ethyl-orthosilicate, Journal of Colloid and Interface Science, 124, 252, 10.1016\u002F0021-9797(88)90346-3\nMatsoukas, 1989, Monomer-addition growth with a slow initiation step, Journal of Colloid and Interface Science, 132, 13, 10.1016\u002F0021-9797(89)90210-5\nChen, 1996, Characteristic aspects of formation of new particles during the growth of monosize silica seeds, Journal of Colloid and Interface Science, 180, 237, 10.1006\u002Fjcis.1996.0295\nNakanish, 1988, Growth of seeded silica from TEOS in ethanol, Nippon-Seramikkusu-Kyokai-Gakujutsu-Ronbunshi, 96, 719, 10.2109\u002Fjcersj.96.719\nNielson, 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2007, Fully transparent thin-film transistor devices based on SnO2 nanowires, Nano Lett., 7, 2463, 10.1021\u002Fnl0712217\nLee, 2012, Physical\u002Fchemical properties of tin oxide thin film transistors prepared using plasma-enhanced atomic layer deposition, Mater. Res. Bull., 47, 3052, 10.1016\u002Fj.materresbull.2012.04.120\nJeon, 2015, Vertically ordered SnO2 nanobamboos for substantially improved detection of volatile reducing gases, J. Mater. Chem., 3, 17939, 10.1039\u002FC5TA03293H\nShim, 2015, Utilization of both-side metal decoration in close-packed SnO2 nanodome arrays for ultrasensitive gas sensing, Sensor. Actuator. B Chem., 213, 314, 10.1016\u002Fj.snb.2015.02.103\nMarichy, 2011, Tin dioxide sensing layer grown on tubular nanostructures by a non-aqueous atomic layer deposition process, Adv. Funct. Mater., 21, 658, 10.1002\u002Fadfm.201001572\nDixon, 2016, n-Type doped transparent conducting binary oxides: an overview, J. Mater. Chem. C, 4, 6946, 10.1039\u002FC6TC01881E\nJung, 2017, Solution-processed SnO2 thin film for a hysteresis-free planar perovskite solar cell with a power conversion efficiency of 19.2%, J. Mater. Chem., 5, 24790, 10.1039\u002FC7TA08040A\nCho, 2017, Ta-Doped SnO2 as a reduction-resistant oxide electrode for DRAM capacitors, J. Mater. Chem. C, 5, 9405, 10.1039\u002FC7TC03467A\nLee, 2001, Electrical properties of Ta-doped SnO2 thin films prepared by the metal–organic chemical-vapor deposition method, Appl. Phys. Lett., 78, 350, 10.1063\u002F1.1337640\nPatil, 2003, Effect of substrate temperature on structural, electrical and optical properties of sprayed tin oxide (SnO2) thin films, Ceram. Int., 29, 725, 10.1016\u002FS0272-8842(02)00224-9\nYu, 2017, Highly conducting and transparent antimony doped tin oxide thin films: the role of sputtering power density, Ceram. Int., 43, 5654, 10.1016\u002Fj.ceramint.2017.01.099\nDücsö, 1996, Deposition of tin oxide into porous silicon by atomic layer epitaxy, J. Electrochem. Soc., 143, 683, 10.1149\u002F1.1836500\nLu, 2004, Microstructure characterisation of ALD-grown epitaxial SnO2 thin films, J. Cryst. Growth, 260, 191, 10.1016\u002Fj.jcrysgro.2003.08.042\nMullings, 2013, Tin oxide atomic layer deposition from tetrakis(dimethylamino)tin and water, J. Vac. Sci. Technol. A, 31, 061503, 10.1116\u002F1.4812717\nElam, 2008, Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin, J. Vac. Sci. Technol. A, 26, 244, 10.1116\u002F1.2835087\nChoi, 2014, SnO2 thin films grown by atomic layer deposition using a novel Sn precursor, Appl. Surf. Sci., 320, 188, 10.1016\u002Fj.apsusc.2014.09.054\nHeo, 2010, Low temperature atomic layer deposition of tin oxide, Chem. Mater., 22, 4964, 10.1021\u002Fcm1011108\nKim, 2019, Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis(N-ethoxy-2,2-dimethyl propanamido)tin precursor, Ceram. Int., 45, 5124, 10.1016\u002Fj.ceramint.2018.09.263\nHawker, 1992, Equilibrium vapour pressures of tetraorganostannanes, Chemosphere, 25, 427, 10.1016\u002F0045-6535(92)90276-W\nWarner, 2015, Atomic layer deposition of tin oxide and zinc tin oxide using tetraethyltin and ozone, J. Vac. Sci. Technol. A, 33, 021517, 10.1116\u002F1.4907562\nBiswas, 1983, Vapor phase deposition of aluminum film on quartz substrate, J. Electrochem. Soc., 130, 234, 10.1149\u002F1.2119669\nYamashita, 2011, Dependence of the decomposition of trimethylaluminum on oxygen concentration, J. Electrochem. Soc., 158, H93, 10.1149\u002F1.3517080\nChistiakova, 2018, In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition, J. Vac. Sci. Technol. A, 36, 02D401, 10.1116\u002F1.5015967\nHeo, 2012, Structural and optical properties of ZnO thin films grown by using atomic layer deposition on O2-plasma-treated flexible PES substrates, J. Korean Phys. Soc., 60, 2038, 10.3938\u002Fjkps.60.2038\nHeo, 2012, Atomic layer deposition of tin oxide with nitric oxide as an oxidant gas, J. Mater. Chem., 22, 4599, 10.1039\u002Fc2jm16557k\nArlinghaus, 1974, Energy bands in stannic oxide (SnO2), J. Phys. Chem. Solids, 35, 931, 10.1016\u002FS0022-3697(74)80102-2\nChoi, 2014, Highly conductive SnO2 thin films deposited by atomic layer deposition using tetrakis-dimethyl-amine-tin precursor and ozone reactant, Surf. Coating. Technol., 259, 238, 10.1016\u002Fj.surfcoat.2014.02.012\nKuang, 2018, Low-temperature plasma-assisted atomic-layer-deposited SnO2 as an electron transport layer in planar perovskite solar cells, ACS Appl. Mater. 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