The improvement of optical reactivity for TiO2 thin films by N2–H2 plasma surface-treatment

Journal of Crystal Growth - Tập 260 - Trang 118-124 - 2004
Lei Miao1, Sakae Tanemura1, Hiroshige Watanabe1, Yukimasa Mori2, Kenji Kaneko3, Shoichi Toh3
1Department of Environmental Technology & Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
2Materials Research Laboratory, NGK Insulators Ltd, Mizuho-ku, Nagoya 467-8530, Japan
3Department of Material Science and Engineering & HVEM Laboratory, Kyushu University, Higasi-ku, Fukuoka 812-8581, Japan

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Journal of Crystal Growth

Tập 260

118-124

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